JPS643249B2 - - Google Patents

Info

Publication number
JPS643249B2
JPS643249B2 JP8345980A JP8345980A JPS643249B2 JP S643249 B2 JPS643249 B2 JP S643249B2 JP 8345980 A JP8345980 A JP 8345980A JP 8345980 A JP8345980 A JP 8345980A JP S643249 B2 JPS643249 B2 JP S643249B2
Authority
JP
Japan
Prior art keywords
layer
group
polymer compound
photosensitive
forming material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8345980A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5710136A (en
Inventor
Kotaro Nagasawa
Kunio Morikubo
Masaaki Kawakami
Susumu Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Priority to JP8345980A priority Critical patent/JPS5710136A/ja
Publication of JPS5710136A publication Critical patent/JPS5710136A/ja
Publication of JPS643249B2 publication Critical patent/JPS643249B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP8345980A 1980-06-21 1980-06-21 Photosensitive image forming material Granted JPS5710136A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8345980A JPS5710136A (en) 1980-06-21 1980-06-21 Photosensitive image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8345980A JPS5710136A (en) 1980-06-21 1980-06-21 Photosensitive image forming material

Publications (2)

Publication Number Publication Date
JPS5710136A JPS5710136A (en) 1982-01-19
JPS643249B2 true JPS643249B2 (Direct) 1989-01-20

Family

ID=13803041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8345980A Granted JPS5710136A (en) 1980-06-21 1980-06-21 Photosensitive image forming material

Country Status (1)

Country Link
JP (1) JPS5710136A (Direct)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58137830A (ja) * 1982-02-10 1983-08-16 Somar Corp 裏焼き用画像形成材料
JPS58139134A (ja) * 1982-02-13 1983-08-18 Toyobo Co Ltd 着色レリ−フ用感光性樹脂構成体および着色レリ−フ板
DE3379983D1 (en) * 1982-11-01 1989-07-06 Du Pont Single exposure positive contact litho film
JPH02132443A (ja) * 1987-11-02 1990-05-21 Matsushita Electric Ind Co Ltd パターン形成材料

Also Published As

Publication number Publication date
JPS5710136A (en) 1982-01-19

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