JPS5710136A - Photosensitive image forming material - Google Patents

Photosensitive image forming material

Info

Publication number
JPS5710136A
JPS5710136A JP8345980A JP8345980A JPS5710136A JP S5710136 A JPS5710136 A JP S5710136A JP 8345980 A JP8345980 A JP 8345980A JP 8345980 A JP8345980 A JP 8345980A JP S5710136 A JPS5710136 A JP S5710136A
Authority
JP
Japan
Prior art keywords
linking
cross
light shielding
molecular compound
shielding agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8345980A
Other languages
Japanese (ja)
Other versions
JPS643249B2 (en
Inventor
Kotaro Nagasawa
Kunio Morikubo
Masaaki Kawakami
Susumu Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Somar Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp, Somar Manufacturing Co Ltd filed Critical Somar Corp
Priority to JP8345980A priority Critical patent/JPS5710136A/en
Publication of JPS5710136A publication Critical patent/JPS5710136A/en
Publication of JPS643249B2 publication Critical patent/JPS643249B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To obtain high density and high sensitivity by forming at least two photosensitive layers having different specified compositions and by adding fine particles of a ferromagnetic body as a light shielding agent to the inner 1st layer. CONSTITUTION:Two photocross-linking and photosensitive layers are formed. The intermediate 1st layer contains fine particles of a ferromagnetic body as a light shielding agent, an alkali-soluble high-molecular compound with no cross-linkability in itself and a cross-linking agent, and the outer 2nd layer contains no light shielding agent practically and contains a self-cross-linking alkali-soluble high-molecular compound. The higly photocross-linking high-molecular compound contained in the 2nd layer receiving active light directly has ethylenic unsatd. bonds and free carboxyl groups at the side chain, and it includes a compound represented by formula I (where Ar is optionally substituted phenyl, R<1> is H, alkyl, cycloalkyl or aralkyl, m1 is about 50-80mol% and n1 is about 50-20mol%).
JP8345980A 1980-06-21 1980-06-21 Photosensitive image forming material Granted JPS5710136A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8345980A JPS5710136A (en) 1980-06-21 1980-06-21 Photosensitive image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8345980A JPS5710136A (en) 1980-06-21 1980-06-21 Photosensitive image forming material

Publications (2)

Publication Number Publication Date
JPS5710136A true JPS5710136A (en) 1982-01-19
JPS643249B2 JPS643249B2 (en) 1989-01-20

Family

ID=13803041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8345980A Granted JPS5710136A (en) 1980-06-21 1980-06-21 Photosensitive image forming material

Country Status (1)

Country Link
JP (1) JPS5710136A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58137830A (en) * 1982-02-10 1983-08-16 Somar Corp Image forming material for reversed printing
JPS58139134A (en) * 1982-02-13 1983-08-18 Toyobo Co Ltd Photosensitive resin structure for colored relief and colored relief plate
JPS5997137A (en) * 1982-11-01 1984-06-04 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− Multilayer light-soluble lithographic element
JPH02132443A (en) * 1987-11-02 1990-05-21 Matsushita Electric Ind Co Ltd Pattern forming material

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58137830A (en) * 1982-02-10 1983-08-16 Somar Corp Image forming material for reversed printing
JPH0229206B2 (en) * 1982-02-10 1990-06-28 Somar Corp
JPS58139134A (en) * 1982-02-13 1983-08-18 Toyobo Co Ltd Photosensitive resin structure for colored relief and colored relief plate
JPS5997137A (en) * 1982-11-01 1984-06-04 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− Multilayer light-soluble lithographic element
JPH0259976B2 (en) * 1982-11-01 1990-12-14 Ii Ai Deyuhon De Nimoasu Ando Co
JPH02132443A (en) * 1987-11-02 1990-05-21 Matsushita Electric Ind Co Ltd Pattern forming material

Also Published As

Publication number Publication date
JPS643249B2 (en) 1989-01-20

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