JPS6412375B2 - - Google Patents

Info

Publication number
JPS6412375B2
JPS6412375B2 JP55076205A JP7620580A JPS6412375B2 JP S6412375 B2 JPS6412375 B2 JP S6412375B2 JP 55076205 A JP55076205 A JP 55076205A JP 7620580 A JP7620580 A JP 7620580A JP S6412375 B2 JPS6412375 B2 JP S6412375B2
Authority
JP
Japan
Prior art keywords
image forming
photosensitive layer
image
forming material
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55076205A
Other languages
English (en)
Japanese (ja)
Other versions
JPS572035A (en
Inventor
Takeo Kodaira
Takao Taguchi
Takeo Sugiura
Takatoshi Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okamoto Chemical Industry Co Ltd
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Okamoto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd, Okamoto Chemical Industry Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP7620580A priority Critical patent/JPS572035A/ja
Publication of JPS572035A publication Critical patent/JPS572035A/ja
Publication of JPS6412375B2 publication Critical patent/JPS6412375B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP7620580A 1980-06-06 1980-06-06 Image forming material Granted JPS572035A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7620580A JPS572035A (en) 1980-06-06 1980-06-06 Image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7620580A JPS572035A (en) 1980-06-06 1980-06-06 Image forming material

Publications (2)

Publication Number Publication Date
JPS572035A JPS572035A (en) 1982-01-07
JPS6412375B2 true JPS6412375B2 (Direct) 1989-02-28

Family

ID=13598650

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7620580A Granted JPS572035A (en) 1980-06-06 1980-06-06 Image forming material

Country Status (1)

Country Link
JP (1) JPS572035A (Direct)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5993443A (ja) * 1982-11-19 1984-05-29 Sekisui Chem Co Ltd 感光性組成物
JPH06103391B2 (ja) * 1985-09-20 1994-12-14 富士写真フイルム株式会社 感光性記録材料
JP5189448B2 (ja) * 2008-09-26 2013-04-24 富士フイルム株式会社 平版印刷版原版及び平版印刷版の製版方法

Also Published As

Publication number Publication date
JPS572035A (en) 1982-01-07

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