JPS6421054A - Film forming method - Google Patents
Film forming methodInfo
- Publication number
- JPS6421054A JPS6421054A JP17570387A JP17570387A JPS6421054A JP S6421054 A JPS6421054 A JP S6421054A JP 17570387 A JP17570387 A JP 17570387A JP 17570387 A JP17570387 A JP 17570387A JP S6421054 A JPS6421054 A JP S6421054A
- Authority
- JP
- Japan
- Prior art keywords
- substrate material
- surface film
- ion implantation
- film
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17570387A JPS6421054A (en) | 1987-07-14 | 1987-07-14 | Film forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17570387A JPS6421054A (en) | 1987-07-14 | 1987-07-14 | Film forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6421054A true JPS6421054A (en) | 1989-01-24 |
Family
ID=16000768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17570387A Pending JPS6421054A (en) | 1987-07-14 | 1987-07-14 | Film forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6421054A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009103775A2 (en) * | 2008-02-20 | 2009-08-27 | Sorin Lenz | Methods and compositions for creating an atomic composite of ceramics coated with titanium making use of coating methodology |
EP2018879A3 (en) * | 2007-07-25 | 2010-03-31 | Sorin Dr. Lenz | Methods and compositions for creating an atomic composite of ceramics coated with titanium making use of coating methodology |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62256964A (ja) * | 1986-04-28 | 1987-11-09 | Toshiba Corp | セラミツクスが被着された部材 |
-
1987
- 1987-07-14 JP JP17570387A patent/JPS6421054A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62256964A (ja) * | 1986-04-28 | 1987-11-09 | Toshiba Corp | セラミツクスが被着された部材 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2018879A3 (en) * | 2007-07-25 | 2010-03-31 | Sorin Dr. Lenz | Methods and compositions for creating an atomic composite of ceramics coated with titanium making use of coating methodology |
US8507049B2 (en) | 2007-07-25 | 2013-08-13 | Ceramoss Gmbh | Method and compositions for creating an atomic composite of ceramics coated with titanium making use of coating methodology |
WO2009103775A2 (en) * | 2008-02-20 | 2009-08-27 | Sorin Lenz | Methods and compositions for creating an atomic composite of ceramics coated with titanium making use of coating methodology |
WO2009103775A3 (en) * | 2008-02-20 | 2010-04-29 | Sorin Lenz | Methods and compositions for creating an atomic composite of ceramics coated with titanium making use of coating methodology |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0977255A3 (en) | A method of fabricating an SOI wafer and SOI wafer fabricated by the method | |
WO2002006568A3 (en) | Slicing of single-crystal films using ion implantation | |
TW350094B (en) | Process for producing semiconductor substrate | |
GB2106419A (en) | Growth of structures based on group iv semiconductor materials | |
JPS5516554A (en) | Manufacture of thin film of zinc oxide | |
JPS6421054A (en) | Film forming method | |
KR860006566A (ko) | 금속박막의 형성방법 및 그 형성장치 | |
JPS5331983A (en) | Production of semiconductor substrates | |
JPS6472533A (en) | Manufacture of single crystal semiconductor substrate | |
DK0630422T3 (da) | Fremgangsmåde til fremstilling af tynde film af uorganiske oxider med kontrolleret støkiometri | |
JPS6481116A (en) | Superconductor | |
JPS5687339A (en) | Manufacture of semiconductor device | |
JPS6483655A (en) | Sputtering film formation | |
JPS57134924A (en) | Production of semiconductive single-crystal thin film | |
JPS6411960A (en) | Film forming method | |
JPS5670448A (en) | Oxygen sensor | |
JPS6410522A (en) | Manufacture of oxide superconductor thin film | |
JPS54591A (en) | Element isolating method | |
JPS6467937A (en) | Formation of high breakdown strength buried insulating film | |
JPS6437036A (en) | Manufacture of semiconductor device | |
JPS5651829A (en) | Glassivating method for bevel-type semiconductor element | |
JPS64766A (en) | Semiconductor device | |
JPS6480017A (en) | Manufacture of semiconductor single crystal layer | |
JPS58112374A (ja) | 光起電力装置の製造方法 | |
JPS5325350A (en) | Dicing method of semiconductor substrates |