JPS642034A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
JPS642034A
JPS642034A JP15917787A JP15917787A JPS642034A JP S642034 A JPS642034 A JP S642034A JP 15917787 A JP15917787 A JP 15917787A JP 15917787 A JP15917787 A JP 15917787A JP S642034 A JPS642034 A JP S642034A
Authority
JP
Japan
Prior art keywords
alkali
compound
light absorber
insoluble
soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15917787A
Other languages
English (en)
Other versions
JP2534872B2 (ja
JPH012034A (ja
Inventor
Shinji Konishi
Takanori Yamamoto
Ryotaro Hanawa
Akihiro Furuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP62159177A priority Critical patent/JP2534872B2/ja
Publication of JPH012034A publication Critical patent/JPH012034A/ja
Publication of JPS642034A publication Critical patent/JPS642034A/ja
Application granted granted Critical
Publication of JP2534872B2 publication Critical patent/JP2534872B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
JP62159177A 1987-06-25 1987-06-25 フォトレジスト組成物 Expired - Fee Related JP2534872B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62159177A JP2534872B2 (ja) 1987-06-25 1987-06-25 フォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62159177A JP2534872B2 (ja) 1987-06-25 1987-06-25 フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JPH012034A JPH012034A (ja) 1989-01-06
JPS642034A true JPS642034A (en) 1989-01-06
JP2534872B2 JP2534872B2 (ja) 1996-09-18

Family

ID=15687982

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62159177A Expired - Fee Related JP2534872B2 (ja) 1987-06-25 1987-06-25 フォトレジスト組成物

Country Status (1)

Country Link
JP (1) JP2534872B2 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02226250A (ja) * 1989-02-28 1990-09-07 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH0439663A (ja) * 1990-06-05 1992-02-10 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
WO2008108406A1 (ja) * 2007-03-05 2008-09-12 Fujifilm Corporation フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法
JP2009204889A (ja) * 2008-02-28 2009-09-10 Fujifilm Corp フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法
WO2010116594A1 (ja) * 2009-03-30 2010-10-14 富士フイルム株式会社 フォトレジスト材料およびフォトレジスト膜、これを用いるエッチング方法、ならびに新規アゾ色素化合物
CN103289679A (zh) * 2013-06-04 2013-09-11 安徽大学 一种具有活体细胞显影功能的苯胺衍生物/银纳米复合双光子吸收材料及其制备方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007107622A (ja) 2005-10-14 2007-04-26 Matsushita Electric Ind Co Ltd 動圧軸受装置およびそれを用いたスピンドルモータ

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088941A (ja) * 1983-10-21 1985-05-18 Nagase Kasei Kogyo Kk フオトレジスト組成物
JPS6088942A (ja) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPS62295044A (ja) * 1986-06-16 1987-12-22 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物
JPS63136040A (ja) * 1986-11-28 1988-06-08 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088941A (ja) * 1983-10-21 1985-05-18 Nagase Kasei Kogyo Kk フオトレジスト組成物
JPS6088942A (ja) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPS62295044A (ja) * 1986-06-16 1987-12-22 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物
JPS63136040A (ja) * 1986-11-28 1988-06-08 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02226250A (ja) * 1989-02-28 1990-09-07 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH0439663A (ja) * 1990-06-05 1992-02-10 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
WO2008108406A1 (ja) * 2007-03-05 2008-09-12 Fujifilm Corporation フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法
CN101675117A (zh) * 2007-03-05 2010-03-17 富士胶片株式会社 光致抗蚀用化合物、光致抗蚀液及使用其的蚀刻方法
JP2009204889A (ja) * 2008-02-28 2009-09-10 Fujifilm Corp フォトレジスト用化合物、フォトレジスト液、およびこれを用いるエッチング方法
WO2010116594A1 (ja) * 2009-03-30 2010-10-14 富士フイルム株式会社 フォトレジスト材料およびフォトレジスト膜、これを用いるエッチング方法、ならびに新規アゾ色素化合物
CN103289679A (zh) * 2013-06-04 2013-09-11 安徽大学 一种具有活体细胞显影功能的苯胺衍生物/银纳米复合双光子吸收材料及其制备方法

Also Published As

Publication number Publication date
JP2534872B2 (ja) 1996-09-18

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