DE68912707T2 - Photopolymerisierbare Harzzusammensetzung. - Google Patents

Photopolymerisierbare Harzzusammensetzung.

Info

Publication number
DE68912707T2
DE68912707T2 DE1989612707 DE68912707T DE68912707T2 DE 68912707 T2 DE68912707 T2 DE 68912707T2 DE 1989612707 DE1989612707 DE 1989612707 DE 68912707 T DE68912707 T DE 68912707T DE 68912707 T2 DE68912707 T2 DE 68912707T2
Authority
DE
Germany
Prior art keywords
resin composition
photopolymerizable resin
photopolymerizable
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1989612707
Other languages
English (en)
Other versions
DE68912707D1 (de
Inventor
Junichi Onodera
Shigeru Otawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17447792&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE68912707(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of DE68912707D1 publication Critical patent/DE68912707D1/de
Application granted granted Critical
Publication of DE68912707T2 publication Critical patent/DE68912707T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
DE1989612707 1988-10-24 1989-10-24 Photopolymerisierbare Harzzusammensetzung. Expired - Fee Related DE68912707T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63267662A JP2733672B2 (ja) 1988-10-24 1988-10-24 光重合性樹脂組成物

Publications (2)

Publication Number Publication Date
DE68912707D1 DE68912707D1 (de) 1994-03-10
DE68912707T2 true DE68912707T2 (de) 1994-05-19

Family

ID=17447792

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989612707 Expired - Fee Related DE68912707T2 (de) 1988-10-24 1989-10-24 Photopolymerisierbare Harzzusammensetzung.

Country Status (3)

Country Link
EP (1) EP0366077B1 (de)
JP (1) JP2733672B2 (de)
DE (1) DE68912707T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4023240A1 (de) * 1990-07-21 1992-01-23 Basf Ag Modifizierte emulsionspolymerisate insbesondere fuer in wasser und waessrigen loesungsmitteln entwickelbare photopolymerisierbare aufzeichnungsmaterialien
CA2073147A1 (en) * 1991-07-04 1993-01-05 Mitsubishi Chemical Corporation Photosensitive composition
JP3011864B2 (ja) * 1994-12-09 2000-02-21 日本ペイント株式会社 水現像性感光性樹脂組成物
SG85613A1 (en) * 1998-02-06 2002-01-15 Morton Int Inc Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers
JP2001013679A (ja) * 1999-04-30 2001-01-19 Toagosei Co Ltd レジスト組成物
JP2006313173A (ja) * 2003-07-03 2006-11-16 Hitachi Chem Co Ltd 感光性樹脂組成物、その積層体及びその製造方法
KR100578108B1 (ko) * 2004-08-17 2006-05-10 한국과학기술원 표면에 광반응성기를 가진 나노입자를 포함하는 광고분자조성물
TW201623834A (zh) * 2014-11-28 2016-07-01 Hitachi Automotive Systems Ltd 氣缸裝置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4293635A (en) * 1980-05-27 1981-10-06 E. I. Du Pont De Nemours And Company Photopolymerizable composition with polymeric binder
DE3329443A1 (de) * 1983-08-16 1985-03-07 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes kopiermaterial
JPH0614185B2 (ja) * 1984-04-02 1994-02-23 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた積層体
JPS61166541A (ja) * 1985-01-19 1986-07-28 Fuotopori Ouka Kk 光重合性組成物
DE3504254A1 (de) * 1985-02-08 1986-08-14 Basf Ag, 6700 Ludwigshafen Lichtempfindliches aufzeichnungselement
US4680249A (en) * 1986-05-28 1987-07-14 E. I. Du Pont De Nemours And Company Photopolymerizable composition containing carboxy benzotriazole
DE3619698A1 (de) * 1986-06-16 1987-12-17 Basf Ag Lichtempfindliches aufzeichnungselement
JP2604174B2 (ja) * 1987-03-25 1997-04-30 東京応化工業株式会社 耐熱性感光性樹脂組成物
JP2573490B2 (ja) 1987-04-20 1997-01-22 東京応化工業株式会社 ドライフィルムレジスト用光重合性組成物

Also Published As

Publication number Publication date
JP2733672B2 (ja) 1998-03-30
EP0366077A3 (de) 1991-05-02
DE68912707D1 (de) 1994-03-10
EP0366077B1 (de) 1994-01-26
EP0366077A2 (de) 1990-05-02
JPH02113252A (ja) 1990-04-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee