JPS6419783A - Manufacture of superconductor film - Google Patents

Manufacture of superconductor film

Info

Publication number
JPS6419783A
JPS6419783A JP63157885A JP15788588A JPS6419783A JP S6419783 A JPS6419783 A JP S6419783A JP 63157885 A JP63157885 A JP 63157885A JP 15788588 A JP15788588 A JP 15788588A JP S6419783 A JPS6419783 A JP S6419783A
Authority
JP
Japan
Prior art keywords
film
metallic precursor
pattern
superconductor
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63157885A
Other languages
English (en)
Inventor
Kee Nagetsushiyu Bui
Teii Andaason Jiyon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hewlett Packard Japan Inc
Original Assignee
Yokogawa Hewlett Packard Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Hewlett Packard Ltd filed Critical Yokogawa Hewlett Packard Ltd
Publication of JPS6419783A publication Critical patent/JPS6419783A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0324—Processes for depositing or forming copper oxide superconductor layers from a solution
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0548—Processes for depositing or forming copper oxide superconductor layers by deposition and subsequent treatment, e.g. oxidation of pre-deposited material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/734—From organometallic precursors, e.g. acetylacetonates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/736—From free metal precursors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
JP63157885A 1987-06-26 1988-06-24 Manufacture of superconductor film Pending JPS6419783A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/067,510 US5041420A (en) 1987-06-26 1987-06-26 Method for making superconductor films from organometallic precursors

Publications (1)

Publication Number Publication Date
JPS6419783A true JPS6419783A (en) 1989-01-23

Family

ID=22076462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63157885A Pending JPS6419783A (en) 1987-06-26 1988-06-24 Manufacture of superconductor film

Country Status (3)

Country Link
US (1) US5041420A (ja)
EP (1) EP0296719A3 (ja)
JP (1) JPS6419783A (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5252545A (en) * 1987-07-14 1993-10-12 The United States Of America As Represented By The United States Department Of Energy Dense high temperature ceramic oxide superconductors
DE3855230T2 (de) * 1987-08-28 1996-10-31 Sumitomo Electric Industries Verfahren zur Herstellung eines supraleitenden Gegenstandes
US5132280A (en) * 1987-09-25 1992-07-21 At&T Bell Laboratories Method of producing a superconductive oxide layer on a substrate
US4997809A (en) * 1987-11-18 1991-03-05 International Business Machines Corporation Fabrication of patterned lines of high Tc superconductors
US5795849A (en) * 1987-12-21 1998-08-18 Hickman; Paul L. Bulk ceramic superconductor structures
US4962085A (en) * 1988-04-12 1990-10-09 Inco Alloys International, Inc. Production of oxidic superconductors by zone oxidation of a precursor alloy
US5316579A (en) * 1988-12-27 1994-05-31 Symetrix Corporation Apparatus for forming a thin film with a mist forming means
US6056994A (en) * 1988-12-27 2000-05-02 Symetrix Corporation Liquid deposition methods of fabricating layered superlattice materials
KR930004024B1 (ko) * 1990-04-27 1993-05-19 삼성전기 주식회사 초전도 집적회로소자의 제조방법
US5942376A (en) * 1997-08-14 1999-08-24 Symetrix Corporation Shelf-stable liquid metal arylketone alcoholate solutions and use thereof in photoinitiated patterning of thin films
US5980998A (en) * 1997-09-16 1999-11-09 Sri International Deposition of substances on a surface
US7071121B2 (en) * 2003-10-28 2006-07-04 Hewlett-Packard Development Company, L.P. Patterned ceramic films and method for producing the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63270472A (ja) * 1987-04-27 1988-11-08 Idemitsu Kosan Co Ltd 超伝導性酸化物薄膜の製造法
JPS63279527A (ja) * 1987-05-11 1988-11-16 Toshiba Corp 超電導体装置の製造方法
JPS63279528A (ja) * 1987-05-11 1988-11-16 Toshiba Corp 超電導体装置の製造方法
JPS63304646A (ja) * 1987-06-05 1988-12-12 Hitachi Ltd 超電導体薄膜パタ−ンの形成方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3119707A (en) * 1960-03-31 1964-01-28 Space Technology Lab Inc Method for the deposition of thin films by electron deposition
US3366519A (en) * 1964-01-20 1968-01-30 Texas Instruments Inc Process for manufacturing multilayer film circuits
US3409466A (en) * 1965-01-06 1968-11-05 Texas Instruments Inc Process for electrolessly plating lead on copper
US4098920A (en) * 1976-12-27 1978-07-04 Texaco Inc. Method of continuous production of super conducting wire
JPS5588382A (en) * 1978-12-27 1980-07-04 Fujitsu Ltd Preparation of tunnel junction type josephson element
JPS5810880B2 (ja) * 1979-08-30 1983-02-28 株式会社村田製作所 銅被膜の密着性向上方法
US4409262A (en) * 1982-02-01 1983-10-11 The United States Of America As Represented By The Secretary Of The Navy Fabrication of submicron-wide lines with shadow depositions
US4500566A (en) * 1982-10-07 1985-02-19 General Electric Company Bubble pressure barrier and electrode composite
US4485094A (en) * 1983-01-28 1984-11-27 Westinghouse Electric Corp. Method of making ABO3 of the cubic perovskite structure
US4826808A (en) * 1987-03-27 1989-05-02 Massachusetts Institute Of Technology Preparation of superconducting oxides and oxide-metal composites
JPS63250881A (ja) * 1987-04-07 1988-10-18 Semiconductor Energy Lab Co Ltd 超電導体の作製方法
DE3872430D1 (de) * 1987-04-10 1992-08-06 American Telephone & Telegraph Verfahren zur herstellung einer schicht aus supraleitendem material.
US4880770A (en) * 1987-05-04 1989-11-14 Eastman Kodak Company Metalorganic deposition process for preparing superconducting oxide films
US4843060A (en) * 1987-11-23 1989-06-27 The United States Of America As Represented By The Secretary Of The Navy Method for growing patterned thin films of superconductors

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63270472A (ja) * 1987-04-27 1988-11-08 Idemitsu Kosan Co Ltd 超伝導性酸化物薄膜の製造法
JPS63279527A (ja) * 1987-05-11 1988-11-16 Toshiba Corp 超電導体装置の製造方法
JPS63279528A (ja) * 1987-05-11 1988-11-16 Toshiba Corp 超電導体装置の製造方法
JPS63304646A (ja) * 1987-06-05 1988-12-12 Hitachi Ltd 超電導体薄膜パタ−ンの形成方法

Also Published As

Publication number Publication date
US5041420A (en) 1991-08-20
EP0296719A3 (en) 1990-04-25
EP0296719A2 (en) 1988-12-28

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