JPS641928B2 - - Google Patents

Info

Publication number
JPS641928B2
JPS641928B2 JP15661979A JP15661979A JPS641928B2 JP S641928 B2 JPS641928 B2 JP S641928B2 JP 15661979 A JP15661979 A JP 15661979A JP 15661979 A JP15661979 A JP 15661979A JP S641928 B2 JPS641928 B2 JP S641928B2
Authority
JP
Japan
Prior art keywords
exposure
pattern
reticle
mask
transferred
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15661979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5679430A (en
Inventor
Yoji Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP15661979A priority Critical patent/JPS5679430A/ja
Publication of JPS5679430A publication Critical patent/JPS5679430A/ja
Publication of JPS641928B2 publication Critical patent/JPS641928B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP15661979A 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device Granted JPS5679430A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15661979A JPS5679430A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15661979A JPS5679430A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Publications (2)

Publication Number Publication Date
JPS5679430A JPS5679430A (en) 1981-06-30
JPS641928B2 true JPS641928B2 (ko) 1989-01-13

Family

ID=15631670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15661979A Granted JPS5679430A (en) 1979-12-03 1979-12-03 Manufacture of semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPS5679430A (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH077927U (ja) * 1993-07-20 1995-02-03 大英産業株式会社 日除けシート
JPH0719701U (ja) * 1993-09-13 1995-04-07 東京メガネ製造株式会社 曇止めシール

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113334754B (zh) * 2021-07-01 2023-07-21 河南万顺包装材料有限公司 一种油墨印刷纸表面覆膜工艺

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS505105A (ko) * 1973-05-15 1975-01-20
JPS5322370A (en) * 1976-08-13 1978-03-01 Fujitsu Ltd Inspecting method of semiconductor device
JPS5431282A (en) * 1977-08-12 1979-03-08 Mitsubishi Electric Corp Pattern formation method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH077927U (ja) * 1993-07-20 1995-02-03 大英産業株式会社 日除けシート
JPH0719701U (ja) * 1993-09-13 1995-04-07 東京メガネ製造株式会社 曇止めシール

Also Published As

Publication number Publication date
JPS5679430A (en) 1981-06-30

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