JPS6412528A - Resist development device - Google Patents

Resist development device

Info

Publication number
JPS6412528A
JPS6412528A JP62169245A JP16924587A JPS6412528A JP S6412528 A JPS6412528 A JP S6412528A JP 62169245 A JP62169245 A JP 62169245A JP 16924587 A JP16924587 A JP 16924587A JP S6412528 A JPS6412528 A JP S6412528A
Authority
JP
Japan
Prior art keywords
substrate
projectors
unnecessary resist
parts
irradiated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62169245A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0558649B2 (show.php
Inventor
Shigeki Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62169245A priority Critical patent/JPS6412528A/ja
Publication of JPS6412528A publication Critical patent/JPS6412528A/ja
Publication of JPH0558649B2 publication Critical patent/JPH0558649B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62169245A 1987-07-06 1987-07-06 Resist development device Granted JPS6412528A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62169245A JPS6412528A (en) 1987-07-06 1987-07-06 Resist development device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62169245A JPS6412528A (en) 1987-07-06 1987-07-06 Resist development device

Publications (2)

Publication Number Publication Date
JPS6412528A true JPS6412528A (en) 1989-01-17
JPH0558649B2 JPH0558649B2 (show.php) 1993-08-27

Family

ID=15882932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62169245A Granted JPS6412528A (en) 1987-07-06 1987-07-06 Resist development device

Country Status (1)

Country Link
JP (1) JPS6412528A (show.php)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5470798A (en) * 1990-05-29 1995-11-28 Mitel Corporation Moisture-free sog process

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142321A (ja) * 1985-12-17 1987-06-25 Matsushita Electronics Corp ウエハ−処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142321A (ja) * 1985-12-17 1987-06-25 Matsushita Electronics Corp ウエハ−処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5470798A (en) * 1990-05-29 1995-11-28 Mitel Corporation Moisture-free sog process

Also Published As

Publication number Publication date
JPH0558649B2 (show.php) 1993-08-27

Similar Documents

Publication Publication Date Title
JPS57102016A (en) Pattern generator
JPS6412528A (en) Resist development device
JPS59138335A (ja) ウエハ端部のレジスト露光装置
EP0338889A3 (en) Process for forming dicing lines on wafer
JPS5493974A (en) Projection-system mask alignment unit
JPS57162336A (en) Coating method of resist on wafer
JPS5743420A (en) Mask alignment method
KR200169674Y1 (ko) 스퍼터링 장비의 주변 노광장치
JPS57116342A (en) Manufacture of photomask
JPH021114A (ja) ウエハ周辺露光方法及び装置
JPS523391A (en) Mount used for semiconductor laser
JPS5388567A (en) Laser scribing apparatus
JPS56114326A (en) Mask aligning exposure means
JPS6489424A (en) Resist-pattern forming method
JPS5388728A (en) Method of forming pattern
JPS5710232A (en) Forming method for resist pattern
JPS56107241A (en) Dry etching method
JPS5432337A (en) Identifier of polyhedral jewels
JPS5636134A (en) Forming method for pattern of semiconductor substrate
JPS5235655A (en) Optical centering method using laser light rays in centering operatio of lens
JPS5740926A (en) Device for projection and exposure
JPS6461916A (en) Development of resist
JPS5556672A (en) Light-coupled semiconductor device
JPH01286311A (ja) 遠紫外光によるレジスト硬化装置
JPS5654048A (en) Indication of defective in chip formed within semiconductor wafer