JPS6410056B2 - - Google Patents

Info

Publication number
JPS6410056B2
JPS6410056B2 JP13721680A JP13721680A JPS6410056B2 JP S6410056 B2 JPS6410056 B2 JP S6410056B2 JP 13721680 A JP13721680 A JP 13721680A JP 13721680 A JP13721680 A JP 13721680A JP S6410056 B2 JPS6410056 B2 JP S6410056B2
Authority
JP
Japan
Prior art keywords
photosensitive layer
image
film
substrate
forming material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13721680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5762047A (en
Inventor
Takashi Yamamura
Shunichi Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP13721680A priority Critical patent/JPS5762047A/ja
Publication of JPS5762047A publication Critical patent/JPS5762047A/ja
Publication of JPS6410056B2 publication Critical patent/JPS6410056B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP13721680A 1980-09-30 1980-09-30 Image-forming material Granted JPS5762047A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13721680A JPS5762047A (en) 1980-09-30 1980-09-30 Image-forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13721680A JPS5762047A (en) 1980-09-30 1980-09-30 Image-forming material

Publications (2)

Publication Number Publication Date
JPS5762047A JPS5762047A (en) 1982-04-14
JPS6410056B2 true JPS6410056B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-02-21

Family

ID=15193495

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13721680A Granted JPS5762047A (en) 1980-09-30 1980-09-30 Image-forming material

Country Status (1)

Country Link
JP (1) JPS5762047A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
JPS6270835A (ja) * 1985-09-24 1987-04-01 Kimoto & Co Ltd 剥離による画像形成材料
DE19638447B4 (de) * 1995-09-19 2005-12-08 Ricoh Co., Ltd. Elektrophotographisches Aufzeichnungsmaterial
JP2001013679A (ja) * 1999-04-30 2001-01-19 Toagosei Co Ltd レジスト組成物
ES2322655T5 (es) 2005-11-18 2019-06-27 Agfa Nv Método para fabricar una plancha de impresión litográfica

Also Published As

Publication number Publication date
JPS5762047A (en) 1982-04-14

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