JPS6410055B2 - - Google Patents

Info

Publication number
JPS6410055B2
JPS6410055B2 JP13467180A JP13467180A JPS6410055B2 JP S6410055 B2 JPS6410055 B2 JP S6410055B2 JP 13467180 A JP13467180 A JP 13467180A JP 13467180 A JP13467180 A JP 13467180A JP S6410055 B2 JPS6410055 B2 JP S6410055B2
Authority
JP
Japan
Prior art keywords
photopolymerizable composition
image forming
compound
image
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13467180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5760327A (en
Inventor
Shunichi Hayashi
Takashi Yamamura
Tomomichi Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP13467180A priority Critical patent/JPS5760327A/ja
Publication of JPS5760327A publication Critical patent/JPS5760327A/ja
Publication of JPS6410055B2 publication Critical patent/JPS6410055B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/085Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP13467180A 1980-09-27 1980-09-27 Image forming material Granted JPS5760327A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13467180A JPS5760327A (en) 1980-09-27 1980-09-27 Image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13467180A JPS5760327A (en) 1980-09-27 1980-09-27 Image forming material

Publications (2)

Publication Number Publication Date
JPS5760327A JPS5760327A (en) 1982-04-12
JPS6410055B2 true JPS6410055B2 (hu) 1989-02-21

Family

ID=15133835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13467180A Granted JPS5760327A (en) 1980-09-27 1980-09-27 Image forming material

Country Status (1)

Country Link
JP (1) JPS5760327A (hu)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854334A (ja) * 1981-09-26 1983-03-31 Nitto Electric Ind Co Ltd 画像形成材料
US5034429A (en) * 1987-06-03 1991-07-23 Hitachi Chemical Co., Ltd. Photopolymerizable composition
JP4308585B2 (ja) * 2003-06-09 2009-08-05 Azエレクトロニックマテリアルズ株式会社 感光性樹脂組成物密着性向上剤及びそれを含有する感光性樹脂組成物
JP6325887B2 (ja) * 2014-05-15 2018-05-16 旭化成株式会社 パターン形成用積層体並びにパターン付き基材の製造方法及びパターン付き基材

Also Published As

Publication number Publication date
JPS5760327A (en) 1982-04-12

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