JPS5760327A - Image forming material - Google Patents

Image forming material

Info

Publication number
JPS5760327A
JPS5760327A JP13467180A JP13467180A JPS5760327A JP S5760327 A JPS5760327 A JP S5760327A JP 13467180 A JP13467180 A JP 13467180A JP 13467180 A JP13467180 A JP 13467180A JP S5760327 A JPS5760327 A JP S5760327A
Authority
JP
Japan
Prior art keywords
100pts
halogen
image forming
transparent substrate
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13467180A
Other languages
English (en)
Other versions
JPS6410055B2 (ja
Inventor
Shunichi Hayashi
Takashi Yamamura
Yoshimichi Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Electric Industrial Co Ltd filed Critical Nitto Electric Industrial Co Ltd
Priority to JP13467180A priority Critical patent/JPS5760327A/ja
Publication of JPS5760327A publication Critical patent/JPS5760327A/ja
Publication of JPS6410055B2 publication Critical patent/JPS6410055B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP13467180A 1980-09-27 1980-09-27 Image forming material Granted JPS5760327A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13467180A JPS5760327A (en) 1980-09-27 1980-09-27 Image forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13467180A JPS5760327A (en) 1980-09-27 1980-09-27 Image forming material

Publications (2)

Publication Number Publication Date
JPS5760327A true JPS5760327A (en) 1982-04-12
JPS6410055B2 JPS6410055B2 (ja) 1989-02-21

Family

ID=15133835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13467180A Granted JPS5760327A (en) 1980-09-27 1980-09-27 Image forming material

Country Status (1)

Country Link
JP (1) JPS5760327A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854334A (ja) * 1981-09-26 1983-03-31 Nitto Electric Ind Co Ltd 画像形成材料
EP0294220A2 (en) * 1987-06-03 1988-12-07 Hitachi Chemical Co., Ltd. Photopolymerizable composition
WO2004109404A1 (ja) * 2003-06-09 2004-12-16 Az Electronic Materials (Japan) K.K. 感光性樹脂組成物密着性向上剤及びそれを含有する感光性樹脂組成物
JP2015219311A (ja) * 2014-05-15 2015-12-07 旭化成イーマテリアルズ株式会社 パターン形成用積層体並びにパターン付き基材の製造方法及びパターン付き基材

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854334A (ja) * 1981-09-26 1983-03-31 Nitto Electric Ind Co Ltd 画像形成材料
JPH0145899B2 (ja) * 1981-09-26 1989-10-05 Nitto Denko Corp
EP0294220A2 (en) * 1987-06-03 1988-12-07 Hitachi Chemical Co., Ltd. Photopolymerizable composition
WO2004109404A1 (ja) * 2003-06-09 2004-12-16 Az Electronic Materials (Japan) K.K. 感光性樹脂組成物密着性向上剤及びそれを含有する感光性樹脂組成物
KR101041735B1 (ko) 2003-06-09 2011-06-16 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤 감광성 수지 조성물용 밀착성 향상제 및 이를 함유하는 감광성 수지 조성물
JP2015219311A (ja) * 2014-05-15 2015-12-07 旭化成イーマテリアルズ株式会社 パターン形成用積層体並びにパターン付き基材の製造方法及びパターン付き基材

Also Published As

Publication number Publication date
JPS6410055B2 (ja) 1989-02-21

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