JPS6366425B2 - - Google Patents

Info

Publication number
JPS6366425B2
JPS6366425B2 JP57176424A JP17642482A JPS6366425B2 JP S6366425 B2 JPS6366425 B2 JP S6366425B2 JP 57176424 A JP57176424 A JP 57176424A JP 17642482 A JP17642482 A JP 17642482A JP S6366425 B2 JPS6366425 B2 JP S6366425B2
Authority
JP
Japan
Prior art keywords
film
wiring
wiring conductor
silicon nitride
conductor layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57176424A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5966149A (ja
Inventor
Mitsunao Chiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP17642482A priority Critical patent/JPS5966149A/ja
Publication of JPS5966149A publication Critical patent/JPS5966149A/ja
Publication of JPS6366425B2 publication Critical patent/JPS6366425B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP17642482A 1982-10-08 1982-10-08 半導体装置の製造方法 Granted JPS5966149A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17642482A JPS5966149A (ja) 1982-10-08 1982-10-08 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17642482A JPS5966149A (ja) 1982-10-08 1982-10-08 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5966149A JPS5966149A (ja) 1984-04-14
JPS6366425B2 true JPS6366425B2 (enExample) 1988-12-20

Family

ID=16013451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17642482A Granted JPS5966149A (ja) 1982-10-08 1982-10-08 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5966149A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0175604B1 (en) * 1984-08-23 1989-07-19 Fairchild Semiconductor Corporation A process for forming vias on integrated circuits
JPH02105418A (ja) * 1988-10-14 1990-04-18 Mitsubishi Electric Corp 樹脂封止型半導体装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54142981A (en) * 1978-04-27 1979-11-07 Matsushita Electric Ind Co Ltd Manufacture of insulation gate type semiconductor device

Also Published As

Publication number Publication date
JPS5966149A (ja) 1984-04-14

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