JPS6360898B2 - - Google Patents

Info

Publication number
JPS6360898B2
JPS6360898B2 JP56087566A JP8756681A JPS6360898B2 JP S6360898 B2 JPS6360898 B2 JP S6360898B2 JP 56087566 A JP56087566 A JP 56087566A JP 8756681 A JP8756681 A JP 8756681A JP S6360898 B2 JPS6360898 B2 JP S6360898B2
Authority
JP
Japan
Prior art keywords
group
plasma
resist
vinyl
biphenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56087566A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57202532A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP56087566A priority Critical patent/JPS57202532A/ja
Publication of JPS57202532A publication Critical patent/JPS57202532A/ja
Publication of JPS6360898B2 publication Critical patent/JPS6360898B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56087566A 1981-06-09 1981-06-09 Formation of pattern Granted JPS57202532A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56087566A JPS57202532A (en) 1981-06-09 1981-06-09 Formation of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56087566A JPS57202532A (en) 1981-06-09 1981-06-09 Formation of pattern

Publications (2)

Publication Number Publication Date
JPS57202532A JPS57202532A (en) 1982-12-11
JPS6360898B2 true JPS6360898B2 (Sortimente) 1988-11-25

Family

ID=13918532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56087566A Granted JPS57202532A (en) 1981-06-09 1981-06-09 Formation of pattern

Country Status (1)

Country Link
JP (1) JPS57202532A (Sortimente)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211143A (en) * 1981-06-23 1982-12-24 Oki Electric Ind Co Ltd Formation of micropattern
JPS5891632A (ja) * 1981-11-27 1983-05-31 Oki Electric Ind Co Ltd 微細パタ−ン形成方法
JPS62137830A (ja) * 1985-12-12 1987-06-20 Mitsubishi Electric Corp 微細パタ−ン形成方法
JPS63250125A (ja) * 1987-04-06 1988-10-18 Nec Yamagata Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS57202532A (en) 1982-12-11

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