JPS6360893B2 - - Google Patents

Info

Publication number
JPS6360893B2
JPS6360893B2 JP56087569A JP8756981A JPS6360893B2 JP S6360893 B2 JPS6360893 B2 JP S6360893B2 JP 56087569 A JP56087569 A JP 56087569A JP 8756981 A JP8756981 A JP 8756981A JP S6360893 B2 JPS6360893 B2 JP S6360893B2
Authority
JP
Japan
Prior art keywords
group
plasma
resist
benzyl
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56087569A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57202535A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP56087569A priority Critical patent/JPS57202535A/ja
Publication of JPS57202535A publication Critical patent/JPS57202535A/ja
Publication of JPS6360893B2 publication Critical patent/JPS6360893B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56087569A 1981-06-09 1981-06-09 Formation of negative resist pattern Granted JPS57202535A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56087569A JPS57202535A (en) 1981-06-09 1981-06-09 Formation of negative resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56087569A JPS57202535A (en) 1981-06-09 1981-06-09 Formation of negative resist pattern

Publications (2)

Publication Number Publication Date
JPS57202535A JPS57202535A (en) 1982-12-11
JPS6360893B2 true JPS6360893B2 (Sortimente) 1988-11-25

Family

ID=13918624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56087569A Granted JPS57202535A (en) 1981-06-09 1981-06-09 Formation of negative resist pattern

Country Status (1)

Country Link
JP (1) JPS57202535A (Sortimente)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57211143A (en) * 1981-06-23 1982-12-24 Oki Electric Ind Co Ltd Formation of micropattern
US4552833A (en) * 1984-05-14 1985-11-12 International Business Machines Corporation Radiation sensitive and oxygen plasma developable resist
GB8427149D0 (en) * 1984-10-26 1984-12-05 Ucb Sa Resist materials
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4617085A (en) * 1985-09-03 1986-10-14 General Electric Company Process for removing organic material in a patterned manner from an organic film

Also Published As

Publication number Publication date
JPS57202535A (en) 1982-12-11

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