JPS6360375B2 - - Google Patents
Info
- Publication number
- JPS6360375B2 JPS6360375B2 JP55020501A JP2050180A JPS6360375B2 JP S6360375 B2 JPS6360375 B2 JP S6360375B2 JP 55020501 A JP55020501 A JP 55020501A JP 2050180 A JP2050180 A JP 2050180A JP S6360375 B2 JPS6360375 B2 JP S6360375B2
- Authority
- JP
- Japan
- Prior art keywords
- oxygen
- sample
- exposure
- coating film
- pgma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 229920002454 poly(glycidyl methacrylate) polymer Polymers 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 229920002189 poly(glycerol 1-O-monomethacrylate) polymer Polymers 0.000 description 8
- 239000003973 paint Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2050180A JPS56117235A (en) | 1980-02-22 | 1980-02-22 | Pattern forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2050180A JPS56117235A (en) | 1980-02-22 | 1980-02-22 | Pattern forming method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56117235A JPS56117235A (en) | 1981-09-14 |
| JPS6360375B2 true JPS6360375B2 (fr) | 1988-11-24 |
Family
ID=12028902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2050180A Granted JPS56117235A (en) | 1980-02-22 | 1980-02-22 | Pattern forming method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56117235A (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0447574U (fr) * | 1990-08-24 | 1992-04-22 |
-
1980
- 1980-02-22 JP JP2050180A patent/JPS56117235A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0447574U (fr) * | 1990-08-24 | 1992-04-22 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56117235A (en) | 1981-09-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5178989A (en) | Pattern forming and transferring processes | |
| JP5033891B2 (ja) | ペリクル膜の製造方法 | |
| US6087076A (en) | Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment | |
| US4704347A (en) | Method of manufacturing a semiconductor device, in which a photolacquer mask is formed by means of a two-layer lacquer system. | |
| US4590149A (en) | Method for fine pattern formation on a photoresist | |
| JPS6360375B2 (fr) | ||
| JPS59124134A (ja) | レジスト・マスクの形成方法 | |
| JPH09260257A (ja) | レンズ汚染を防止した投影露光装置およびそれを用いた半導体デバイス製造プロセス | |
| JPS62215267A (ja) | 粒体像の形成方法 | |
| JPH03146954A (ja) | レジストパターン形成方法 | |
| JPS6278550A (ja) | 放射感受性フイルムの現像法 | |
| JPS6148704B2 (fr) | ||
| JPS59192208A (ja) | カラ−フイルタ−の製造方法 | |
| JPS6116521A (ja) | レジスト膜除去方法 | |
| JP2956732B2 (ja) | 固体撮像装置カラーフィルターの製造方法 | |
| JPH1130868A (ja) | パタン形成方法 | |
| JPH01307757A (ja) | 露光方法 | |
| JP3563138B2 (ja) | 感光性樹脂組成物を用いたパターン形成方法 | |
| JPH09274313A (ja) | レジストパターンの形成方法 | |
| JPH08241840A (ja) | レジスト・パターンの形成方法 | |
| JPH05275316A (ja) | レジストパターン形成方法 | |
| JPS60217630A (ja) | 遠紫外光用レジスト露光方法 | |
| JP2617923B2 (ja) | パターン形成方法 | |
| JPH11288528A (ja) | 記録媒体製造用原盤の製造方法 | |
| JPH0550845B2 (fr) |