JPS635635U - - Google Patents

Info

Publication number
JPS635635U
JPS635635U JP10076686U JP10076686U JPS635635U JP S635635 U JPS635635 U JP S635635U JP 10076686 U JP10076686 U JP 10076686U JP 10076686 U JP10076686 U JP 10076686U JP S635635 U JPS635635 U JP S635635U
Authority
JP
Japan
Prior art keywords
plasma
substrate
sample chamber
substrate holder
extraction window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10076686U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0452994Y2 (en:Method
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10076686U priority Critical patent/JPH0452994Y2/ja
Publication of JPS635635U publication Critical patent/JPS635635U/ja
Application granted granted Critical
Publication of JPH0452994Y2 publication Critical patent/JPH0452994Y2/ja
Expired legal-status Critical Current

Links

JP10076686U 1986-06-28 1986-06-28 Expired JPH0452994Y2 (en:Method)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10076686U JPH0452994Y2 (en:Method) 1986-06-28 1986-06-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10076686U JPH0452994Y2 (en:Method) 1986-06-28 1986-06-28

Publications (2)

Publication Number Publication Date
JPS635635U true JPS635635U (en:Method) 1988-01-14
JPH0452994Y2 JPH0452994Y2 (en:Method) 1992-12-14

Family

ID=30970895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10076686U Expired JPH0452994Y2 (en:Method) 1986-06-28 1986-06-28

Country Status (1)

Country Link
JP (1) JPH0452994Y2 (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011125471A1 (ja) * 2010-03-31 2011-10-13 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011125471A1 (ja) * 2010-03-31 2011-10-13 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法

Also Published As

Publication number Publication date
JPH0452994Y2 (en:Method) 1992-12-14

Similar Documents

Publication Publication Date Title
JPH0240739B2 (ja) Supatsutasochi
JPS62199767A (ja) イオンプレ−テイング装置
JPS635635U (en:Method)
JPH0484354U (en:Method)
JPH01132765A (ja) マグネトロンスパッタ装置
JPS5585671A (en) Sputtering apparatus
JPH0241584B2 (en:Method)
JPS621865A (ja) マグネトロンスパツタ装置
JPS6082459U (ja) マグネトロンスパツタリング装置のタ−ゲツト
JPS5912866U (ja) 真空蒸着装置
JPH03122293A (ja) 反応性イオンエッチング装置
JPH042773A (ja) 高速成膜スパッタリング装置
JPS6334164U (en:Method)
JPS59177373A (ja) マグネトロンスパツタ装置
JPH0456332U (en:Method)
JPS63162865A (ja) スパツタリングカソ−ド
JP2606033Y2 (ja) スパッタ装置
JPH02102463U (en:Method)
JPS62132169U (en:Method)
JPS6350122U (en:Method)
JPS60165374A (ja) 電子ビ−ム蒸着装置
JPH0311055U (en:Method)
JPH03257163A (ja) マグネトロン型スパッタ装置
JPS6093757U (ja) スパツタリング装置
JPH03106356U (en:Method)