JPH0484354U - - Google Patents
Info
- Publication number
- JPH0484354U JPH0484354U JP12889890U JP12889890U JPH0484354U JP H0484354 U JPH0484354 U JP H0484354U JP 12889890 U JP12889890 U JP 12889890U JP 12889890 U JP12889890 U JP 12889890U JP H0484354 U JPH0484354 U JP H0484354U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- target
- sputtering
- back surface
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12889890U JPH0484354U (en:Method) | 1990-11-29 | 1990-11-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12889890U JPH0484354U (en:Method) | 1990-11-29 | 1990-11-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0484354U true JPH0484354U (en:Method) | 1992-07-22 |
Family
ID=31876336
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12889890U Pending JPH0484354U (en:Method) | 1990-11-29 | 1990-11-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0484354U (en:Method) |
-
1990
- 1990-11-29 JP JP12889890U patent/JPH0484354U/ja active Pending
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