JPS6355858B2 - - Google Patents
Info
- Publication number
- JPS6355858B2 JPS6355858B2 JP58155093A JP15509383A JPS6355858B2 JP S6355858 B2 JPS6355858 B2 JP S6355858B2 JP 58155093 A JP58155093 A JP 58155093A JP 15509383 A JP15509383 A JP 15509383A JP S6355858 B2 JPS6355858 B2 JP S6355858B2
- Authority
- JP
- Japan
- Prior art keywords
- diffraction grating
- light
- incident
- alignment
- quasi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000001427 coherent effect Effects 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 description 12
- 235000012431 wafers Nutrition 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 238000006073 displacement reaction Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58155093A JPS6047420A (ja) | 1983-08-26 | 1983-08-26 | 2重回折格子による位置合わせ装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58155093A JPS6047420A (ja) | 1983-08-26 | 1983-08-26 | 2重回折格子による位置合わせ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6047420A JPS6047420A (ja) | 1985-03-14 |
JPS6355858B2 true JPS6355858B2 (de) | 1988-11-04 |
Family
ID=15598481
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58155093A Granted JPS6047420A (ja) | 1983-08-26 | 1983-08-26 | 2重回折格子による位置合わせ装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6047420A (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03115706U (de) * | 1990-03-09 | 1991-11-29 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53137673A (en) * | 1977-05-03 | 1978-12-01 | Massachusetts Inst Technology | Device for and method of matching plate position |
JPS5617017A (en) * | 1979-07-20 | 1981-02-18 | Nippon Kogaku Kk <Nikon> | Positioning device using bidirectional diffraction grating |
-
1983
- 1983-08-26 JP JP58155093A patent/JPS6047420A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53137673A (en) * | 1977-05-03 | 1978-12-01 | Massachusetts Inst Technology | Device for and method of matching plate position |
JPS5617017A (en) * | 1979-07-20 | 1981-02-18 | Nippon Kogaku Kk <Nikon> | Positioning device using bidirectional diffraction grating |
Also Published As
Publication number | Publication date |
---|---|
JPS6047420A (ja) | 1985-03-14 |
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