JPS6355858B2 - - Google Patents

Info

Publication number
JPS6355858B2
JPS6355858B2 JP58155093A JP15509383A JPS6355858B2 JP S6355858 B2 JPS6355858 B2 JP S6355858B2 JP 58155093 A JP58155093 A JP 58155093A JP 15509383 A JP15509383 A JP 15509383A JP S6355858 B2 JPS6355858 B2 JP S6355858B2
Authority
JP
Japan
Prior art keywords
diffraction grating
light
incident
alignment
quasi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58155093A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6047420A (ja
Inventor
Atsunobu Une
Makoto Inoshiro
Hiroo Kinoshita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP58155093A priority Critical patent/JPS6047420A/ja
Publication of JPS6047420A publication Critical patent/JPS6047420A/ja
Publication of JPS6355858B2 publication Critical patent/JPS6355858B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP58155093A 1983-08-26 1983-08-26 ２重回折格子による位置合わせ装置 Granted JPS6047420A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58155093A JPS6047420A (ja) 1983-08-26 1983-08-26 ２重回折格子による位置合わせ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58155093A JPS6047420A (ja) 1983-08-26 1983-08-26 ２重回折格子による位置合わせ装置

Publications (2)

Publication Number Publication Date
JPS6047420A JPS6047420A (ja) 1985-03-14
JPS6355858B2 true JPS6355858B2 (cs) 1988-11-04

Family

ID=15598481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58155093A Granted JPS6047420A (ja) 1983-08-26 1983-08-26 ２重回折格子による位置合わせ装置

Country Status (1)

Country Link
JP (1) JPS6047420A (cs)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03115706U (cs) * 1990-03-09 1991-11-29

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
JPS5617017A (en) * 1979-07-20 1981-02-18 Nippon Kogaku Kk <Nikon> Positioning device using bidirectional diffraction grating

Also Published As

Publication number Publication date
JPS6047420A (ja) 1985-03-14

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