JPS6354230B2 - - Google Patents
Info
- Publication number
- JPS6354230B2 JPS6354230B2 JP56077655A JP7765581A JPS6354230B2 JP S6354230 B2 JPS6354230 B2 JP S6354230B2 JP 56077655 A JP56077655 A JP 56077655A JP 7765581 A JP7765581 A JP 7765581A JP S6354230 B2 JPS6354230 B2 JP S6354230B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electron
- semiconductor
- channel layer
- control electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
- H10D30/4755—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs having wide bandgap charge-carrier supplying layers, e.g. modulation doped HEMTs such as n-AlGaAs/GaAs HEMTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/05—Manufacture or treatment characterised by using material-based technologies using Group III-V technology
Landscapes
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56077655A JPS57193067A (en) | 1981-05-22 | 1981-05-22 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56077655A JPS57193067A (en) | 1981-05-22 | 1981-05-22 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57193067A JPS57193067A (en) | 1982-11-27 |
JPS6354230B2 true JPS6354230B2 (enrdf_load_stackoverflow) | 1988-10-27 |
Family
ID=13639895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56077655A Granted JPS57193067A (en) | 1981-05-22 | 1981-05-22 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57193067A (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60206074A (ja) * | 1984-03-30 | 1985-10-17 | Fujitsu Ltd | 電界効果型半導体装置 |
FR2566185B1 (fr) * | 1984-06-15 | 1990-03-30 | American Telephone & Telegraph | Structure logique complementaire |
JPH0793428B2 (ja) * | 1984-10-03 | 1995-10-09 | 株式会社日立製作所 | 半導体装置及びその製造方法 |
JPH0815205B2 (ja) * | 1985-01-23 | 1996-02-14 | 株式会社日立製作所 | 半導体装置 |
JPH0793322B2 (ja) * | 1985-09-27 | 1995-10-09 | 株式会社日立製作所 | 半導体装置 |
-
1981
- 1981-05-22 JP JP56077655A patent/JPS57193067A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57193067A (en) | 1982-11-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US12034051B2 (en) | Nitride-based semiconductor device and method of manufacturing the same | |
US4849368A (en) | Method of producing a two-dimensional electron gas semiconductor device | |
US4663643A (en) | Semiconductor device and process for producing the same | |
JP2581452B2 (ja) | 電界効果トランジスタ | |
JP2000277724A (ja) | 電界効果トランジスタとそれを備えた半導体装置及びその製造方法 | |
US5350709A (en) | Method of doping a group III-V compound semiconductor | |
JP2019062115A (ja) | 電界効果トランジスタの製造方法及び電界効果トランジスタ | |
US9252157B2 (en) | Method to form group III-V and Si/Ge FINFET on insulator and integrated circuit fabricated using the method | |
JPS6354230B2 (enrdf_load_stackoverflow) | ||
US20080176391A1 (en) | Method for manufacturing semiconductor device | |
CN112582470A (zh) | 一种常闭型高电子迁移率晶体管及制造方法 | |
JP2005203544A (ja) | 窒化物半導体装置とその製造方法 | |
JPH08306909A (ja) | InGaAs電界効果型トランジスタ | |
JP2013222939A (ja) | 窒化物半導体を用いたトランジスタおよびその製造方法 | |
JPS6354228B2 (enrdf_load_stackoverflow) | ||
JP2685026B2 (ja) | 電界効果トランジスタおよび製造方法 | |
JPS6353711B2 (enrdf_load_stackoverflow) | ||
JPH05335346A (ja) | 半導体装置及びその製造方法 | |
JP2504785B2 (ja) | 半導体集積回路およびその製造方法 | |
JPH05121447A (ja) | 砒化ガリウム電界効果トランジスタ | |
JPH05335341A (ja) | Iii−v族化合物半導体装置の製造方法 | |
JPS6353709B2 (enrdf_load_stackoverflow) | ||
JPH0855861A (ja) | 電界効果トランジスタ、及びその製造方法 | |
JPS6089979A (ja) | 半導体装置 | |
JPS62190772A (ja) | 電界効果トランジスタおよびその製造方法 |