JPS57193067A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS57193067A JPS57193067A JP56077655A JP7765581A JPS57193067A JP S57193067 A JPS57193067 A JP S57193067A JP 56077655 A JP56077655 A JP 56077655A JP 7765581 A JP7765581 A JP 7765581A JP S57193067 A JPS57193067 A JP S57193067A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- approx
- contacted
- gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
- H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
- H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
- H10D30/4755—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs having wide bandgap charge-carrier supplying layers, e.g. modulation doped HEMTs such as n-AlGaAs/GaAs HEMTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/05—Manufacture or treatment characterised by using material-based technologies using Group III-V technology
Landscapes
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56077655A JPS57193067A (en) | 1981-05-22 | 1981-05-22 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56077655A JPS57193067A (en) | 1981-05-22 | 1981-05-22 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57193067A true JPS57193067A (en) | 1982-11-27 |
JPS6354230B2 JPS6354230B2 (enrdf_load_stackoverflow) | 1988-10-27 |
Family
ID=13639895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56077655A Granted JPS57193067A (en) | 1981-05-22 | 1981-05-22 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57193067A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60206074A (ja) * | 1984-03-30 | 1985-10-17 | Fujitsu Ltd | 電界効果型半導体装置 |
JPS6110266A (ja) * | 1984-06-15 | 1986-01-17 | エイ・ティ・アンド・ティ・コーポレーション | 相補型論理構造 |
JPS61168965A (ja) * | 1985-01-23 | 1986-07-30 | Hitachi Ltd | 半導体装置 |
JPS6273674A (ja) * | 1985-09-27 | 1987-04-04 | Hitachi Ltd | 半導体装置 |
US4805005A (en) * | 1984-10-03 | 1989-02-14 | Hitachi, Ltd. | Semiconductor device and manufacturing method of the same |
-
1981
- 1981-05-22 JP JP56077655A patent/JPS57193067A/ja active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60206074A (ja) * | 1984-03-30 | 1985-10-17 | Fujitsu Ltd | 電界効果型半導体装置 |
JPS6110266A (ja) * | 1984-06-15 | 1986-01-17 | エイ・ティ・アンド・ティ・コーポレーション | 相補型論理構造 |
US4805005A (en) * | 1984-10-03 | 1989-02-14 | Hitachi, Ltd. | Semiconductor device and manufacturing method of the same |
JPS61168965A (ja) * | 1985-01-23 | 1986-07-30 | Hitachi Ltd | 半導体装置 |
JPS6273674A (ja) * | 1985-09-27 | 1987-04-04 | Hitachi Ltd | 半導体装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6354230B2 (enrdf_load_stackoverflow) | 1988-10-27 |
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