JPS6342412B2 - - Google Patents
Info
- Publication number
- JPS6342412B2 JPS6342412B2 JP12980482A JP12980482A JPS6342412B2 JP S6342412 B2 JPS6342412 B2 JP S6342412B2 JP 12980482 A JP12980482 A JP 12980482A JP 12980482 A JP12980482 A JP 12980482A JP S6342412 B2 JPS6342412 B2 JP S6342412B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- sio
- pattern
- wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 34
- 239000010409 thin film Substances 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 11
- 239000011347 resin Substances 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 50
- 229910004298 SiO 2 Inorganic materials 0.000 description 30
- 238000001020 plasma etching Methods 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 238000002161 passivation Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910018125 Al-Si Inorganic materials 0.000 description 1
- 229910018182 Al—Cu Inorganic materials 0.000 description 1
- 229910018520 Al—Si Inorganic materials 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 229910018594 Si-Cu Inorganic materials 0.000 description 1
- 229910008465 Si—Cu Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12980482A JPS5919355A (ja) | 1982-07-26 | 1982-07-26 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12980482A JPS5919355A (ja) | 1982-07-26 | 1982-07-26 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5919355A JPS5919355A (ja) | 1984-01-31 |
| JPS6342412B2 true JPS6342412B2 (enrdf_load_html_response) | 1988-08-23 |
Family
ID=15018631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12980482A Granted JPS5919355A (ja) | 1982-07-26 | 1982-07-26 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5919355A (enrdf_load_html_response) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0328035U (enrdf_load_html_response) * | 1990-07-12 | 1991-03-20 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59137997A (ja) * | 1983-01-28 | 1984-08-08 | カシオ計算機株式会社 | 波形メモリ読出し方式 |
| JPS60142400A (ja) * | 1983-12-28 | 1985-07-27 | カシオ計算機株式会社 | 楽音発生器の高調波制限装置 |
| US5045916A (en) * | 1985-01-22 | 1991-09-03 | Fairchild Semiconductor Corporation | Extended silicide and external contact technology |
| JP3603705B2 (ja) | 1999-11-29 | 2004-12-22 | ヤマハ株式会社 | 音源回路およびそれを用いた電話端末装置 |
-
1982
- 1982-07-26 JP JP12980482A patent/JPS5919355A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0328035U (enrdf_load_html_response) * | 1990-07-12 | 1991-03-20 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5919355A (ja) | 1984-01-31 |