JPS6342138Y2 - - Google Patents
Info
- Publication number
- JPS6342138Y2 JPS6342138Y2 JP1985000340U JP34085U JPS6342138Y2 JP S6342138 Y2 JPS6342138 Y2 JP S6342138Y2 JP 1985000340 U JP1985000340 U JP 1985000340U JP 34085 U JP34085 U JP 34085U JP S6342138 Y2 JPS6342138 Y2 JP S6342138Y2
- Authority
- JP
- Japan
- Prior art keywords
- support
- wafer carrier
- pair
- corrosion
- swinging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985000340U JPS6342138Y2 (enExample) | 1985-01-07 | 1985-01-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985000340U JPS6342138Y2 (enExample) | 1985-01-07 | 1985-01-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61116765U JPS61116765U (enExample) | 1986-07-23 |
| JPS6342138Y2 true JPS6342138Y2 (enExample) | 1988-11-04 |
Family
ID=30472092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985000340U Expired JPS6342138Y2 (enExample) | 1985-01-07 | 1985-01-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6342138Y2 (enExample) |
-
1985
- 1985-01-07 JP JP1985000340U patent/JPS6342138Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61116765U (enExample) | 1986-07-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5672212A (en) | Rotational megasonic cleaner/etcher for wafers | |
| JP2756734B2 (ja) | 表面処理装置のウエハ移替装置 | |
| JP2004225089A (ja) | メッキ装置、メッキカップ、およびカソードリング | |
| JP3183098B2 (ja) | 基板処理装置の基板保持具 | |
| KR102565317B1 (ko) | 기판 세정 방법 | |
| JPH0910709A (ja) | 基板処理装置 | |
| JP3560011B2 (ja) | 基板保持具 | |
| JPS63208223A (ja) | ウエハ処理装置 | |
| JPH10177988A (ja) | 半導体ウェーハの処理方法及び装置 | |
| CN220691967U (zh) | 竖立式晶圆表面清洗装置 | |
| JP3439254B2 (ja) | 枚葉式基板洗浄方法および装置 | |
| JP3364620B2 (ja) | 基板処理装置 | |
| JP3325135B2 (ja) | 基板処理装置およびそれに用いられる処理槽 | |
| JP3221767B2 (ja) | アルミニウム管の多連式陽極酸化処理装置 | |
| CN224181511U (zh) | 一种石英舟清洗用支撑结构 | |
| US20050051083A1 (en) | Apparatus for carrying reticles and method of using the same to process reticles | |
| JP2000068364A (ja) | キャリアおよび表面処理方法並びに表面処理装置 | |
| JPS59134834A (ja) | 半導体ウエハの洗浄装置 | |
| JP2000100893A (ja) | 基板処理装置 | |
| CN210222484U (zh) | 一种旋转显定影装置 | |
| JP3048735B2 (ja) | ウェーハ処理装置用搬送機構 | |
| JPH0562955A (ja) | 半導体洗浄装置及び半導体ウエハ保持装置 | |
| JPH08274051A (ja) | ウエーハ洗浄用治具 | |
| JPS6141793A (ja) | 円筒形状物の内側面めつき方法およびそのめつき装置 | |
| JPS60130832A (ja) | 半導体ウエハの水洗装置 |