JPS6338697B2 - - Google Patents

Info

Publication number
JPS6338697B2
JPS6338697B2 JP18097881A JP18097881A JPS6338697B2 JP S6338697 B2 JPS6338697 B2 JP S6338697B2 JP 18097881 A JP18097881 A JP 18097881A JP 18097881 A JP18097881 A JP 18097881A JP S6338697 B2 JPS6338697 B2 JP S6338697B2
Authority
JP
Japan
Prior art keywords
mark
vernier
pattern
image
distortion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18097881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5883853A (ja
Inventor
Koichi Oono
Toshio Matsura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP56180978A priority Critical patent/JPS5883853A/ja
Publication of JPS5883853A publication Critical patent/JPS5883853A/ja
Publication of JPS6338697B2 publication Critical patent/JPS6338697B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP56180978A 1981-11-13 1981-11-13 投影光学系のディストーシヨン検査方法 Granted JPS5883853A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56180978A JPS5883853A (ja) 1981-11-13 1981-11-13 投影光学系のディストーシヨン検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56180978A JPS5883853A (ja) 1981-11-13 1981-11-13 投影光学系のディストーシヨン検査方法

Publications (2)

Publication Number Publication Date
JPS5883853A JPS5883853A (ja) 1983-05-19
JPS6338697B2 true JPS6338697B2 (ko) 1988-08-01

Family

ID=16092600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56180978A Granted JPS5883853A (ja) 1981-11-13 1981-11-13 投影光学系のディストーシヨン検査方法

Country Status (1)

Country Link
JP (1) JPS5883853A (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10176974A (ja) * 1996-12-19 1998-06-30 Nikon Corp 投影光学系の収差測定方法
US6947119B2 (en) 2002-07-30 2005-09-20 Canon Kabushiki Kaisha Distortion measurement method and exposure apparatus

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6095435A (ja) * 1983-10-28 1985-05-28 Nippon Kogaku Kk <Nikon> 露光用マスク
JP2611760B2 (ja) * 1986-09-11 1997-05-21 キヤノン株式会社 半導体露光装置
JPS63151948A (ja) * 1986-12-15 1988-06-24 Nec Corp 露光用マスク
US4742233A (en) * 1986-12-22 1988-05-03 American Telephone And Telgraph Company Method and apparatus for automated reading of vernier patterns
JPS63281439A (ja) * 1987-05-13 1988-11-17 Fujitsu Ltd 焼き付けずれチェック方法
JPS647043A (en) * 1987-06-30 1989-01-11 Nec Corp Photomask
JP2666859B2 (ja) * 1988-11-25 1997-10-22 日本電気株式会社 目合せ用バーニヤパターンを備えた半導体装置
JP6037876B2 (ja) * 2013-02-12 2016-12-07 東芝情報システム株式会社 半導体装置、積層ズレ測定装置及び積層ズレ測定方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10176974A (ja) * 1996-12-19 1998-06-30 Nikon Corp 投影光学系の収差測定方法
US6947119B2 (en) 2002-07-30 2005-09-20 Canon Kabushiki Kaisha Distortion measurement method and exposure apparatus

Also Published As

Publication number Publication date
JPS5883853A (ja) 1983-05-19

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