JPS6336490B2 - - Google Patents

Info

Publication number
JPS6336490B2
JPS6336490B2 JP53124165A JP12416578A JPS6336490B2 JP S6336490 B2 JPS6336490 B2 JP S6336490B2 JP 53124165 A JP53124165 A JP 53124165A JP 12416578 A JP12416578 A JP 12416578A JP S6336490 B2 JPS6336490 B2 JP S6336490B2
Authority
JP
Japan
Prior art keywords
photosensitive
developer
weight
water
lithographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53124165A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5552054A (en
Inventor
Nobumasa Sasa
Noryasu Kita
Yoshio Kurita
Kazuo Noguchi
Atsuo Yamazaki
Akio Iwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP12416578A priority Critical patent/JPS5552054A/ja
Publication of JPS5552054A publication Critical patent/JPS5552054A/ja
Publication of JPS6336490B2 publication Critical patent/JPS6336490B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12416578A 1978-10-11 1978-10-11 Developing solution composition Granted JPS5552054A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12416578A JPS5552054A (en) 1978-10-11 1978-10-11 Developing solution composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12416578A JPS5552054A (en) 1978-10-11 1978-10-11 Developing solution composition

Publications (2)

Publication Number Publication Date
JPS5552054A JPS5552054A (en) 1980-04-16
JPS6336490B2 true JPS6336490B2 (enrdf_load_stackoverflow) 1988-07-20

Family

ID=14878546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12416578A Granted JPS5552054A (en) 1978-10-11 1978-10-11 Developing solution composition

Country Status (1)

Country Link
JP (1) JPS5552054A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS59142547A (ja) * 1983-02-02 1984-08-15 Nippon Telegr & Teleph Corp <Ntt> 溶解速度差現像液の像鮮明性増大剤

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534929B2 (enrdf_load_stackoverflow) * 1974-02-28 1980-09-10
JPS5344202A (en) * 1976-10-01 1978-04-20 Fuji Photo Film Co Ltd Developer composition and developing method

Also Published As

Publication number Publication date
JPS5552054A (en) 1980-04-16

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