JPS5552054A - Developing solution composition - Google Patents

Developing solution composition

Info

Publication number
JPS5552054A
JPS5552054A JP12416578A JP12416578A JPS5552054A JP S5552054 A JPS5552054 A JP S5552054A JP 12416578 A JP12416578 A JP 12416578A JP 12416578 A JP12416578 A JP 12416578A JP S5552054 A JPS5552054 A JP S5552054A
Authority
JP
Japan
Prior art keywords
developing solution
organic solvent
water
developing
anionic surfactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12416578A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6336490B2 (enrdf_load_stackoverflow
Inventor
Nobumasa Sasa
Noriyasu Kita
Yoshio Kurita
Kazuo Noguchi
Atsuo Yamazaki
Akio Iwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP12416578A priority Critical patent/JPS5552054A/ja
Publication of JPS5552054A publication Critical patent/JPS5552054A/ja
Publication of JPS6336490B2 publication Critical patent/JPS6336490B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12416578A 1978-10-11 1978-10-11 Developing solution composition Granted JPS5552054A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12416578A JPS5552054A (en) 1978-10-11 1978-10-11 Developing solution composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12416578A JPS5552054A (en) 1978-10-11 1978-10-11 Developing solution composition

Publications (2)

Publication Number Publication Date
JPS5552054A true JPS5552054A (en) 1980-04-16
JPS6336490B2 JPS6336490B2 (enrdf_load_stackoverflow) 1988-07-20

Family

ID=14878546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12416578A Granted JPS5552054A (en) 1978-10-11 1978-10-11 Developing solution composition

Country Status (1)

Country Link
JP (1) JPS5552054A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS59142547A (ja) * 1983-02-02 1984-08-15 Nippon Telegr & Teleph Corp <Ntt> 溶解速度差現像液の像鮮明性増大剤

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2508618A1 (de) * 1974-02-28 1975-09-04 Fuji Photo Film Co Ltd Lichtempfindliche masse
DE2744097A1 (de) * 1976-10-01 1978-04-06 Fuji Photo Film Co Ltd Verfahren zur entwicklung einer lithographischen druckplatte

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2508618A1 (de) * 1974-02-28 1975-09-04 Fuji Photo Film Co Ltd Lichtempfindliche masse
JPS50118802A (enrdf_load_stackoverflow) * 1974-02-28 1975-09-17
DE2744097A1 (de) * 1976-10-01 1978-04-06 Fuji Photo Film Co Ltd Verfahren zur entwicklung einer lithographischen druckplatte

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134847A (en) * 1979-04-06 1980-10-21 Nec Corp Manufacture of resist image
JPS59142547A (ja) * 1983-02-02 1984-08-15 Nippon Telegr & Teleph Corp <Ntt> 溶解速度差現像液の像鮮明性増大剤

Also Published As

Publication number Publication date
JPS6336490B2 (enrdf_load_stackoverflow) 1988-07-20

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