JPS63305917A - 超純水製造方法及びその製造装置 - Google Patents

超純水製造方法及びその製造装置

Info

Publication number
JPS63305917A
JPS63305917A JP62139782A JP13978287A JPS63305917A JP S63305917 A JPS63305917 A JP S63305917A JP 62139782 A JP62139782 A JP 62139782A JP 13978287 A JP13978287 A JP 13978287A JP S63305917 A JPS63305917 A JP S63305917A
Authority
JP
Japan
Prior art keywords
water
volatile components
raw water
water vapor
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62139782A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0515486B2 (enrdf_load_stackoverflow
Inventor
Hideaki Kurokawa
秀昭 黒川
Akira Yamada
章 山田
Yasuo Koseki
小関　康雄
Harumi Matsuzaki
松崎　晴美
Katsuya Ebara
江原　勝也
Sankichi Takahashi
燦吉 高橋
Hiroaki Yoda
裕明 依田
Nobuatsu Hayashi
林　伸厚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62139782A priority Critical patent/JPS63305917A/ja
Priority to DE88104672T priority patent/DE3884435T2/de
Priority to EP88104672A priority patent/EP0284052B1/en
Priority to US07/172,583 priority patent/US4879041A/en
Priority to KR1019880003177A priority patent/KR960003543B1/ko
Publication of JPS63305917A publication Critical patent/JPS63305917A/ja
Publication of JPH0515486B2 publication Critical patent/JPH0515486B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Separation Using Semi-Permeable Membranes (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP62139782A 1987-03-25 1987-06-05 超純水製造方法及びその製造装置 Granted JPS63305917A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP62139782A JPS63305917A (ja) 1987-06-05 1987-06-05 超純水製造方法及びその製造装置
DE88104672T DE3884435T2 (de) 1987-03-25 1988-03-23 Verfahren zur Erzeugung hochreinen Wassers und Verfahren zur Verwendung dieses Wassers.
EP88104672A EP0284052B1 (en) 1987-03-25 1988-03-23 Process for producing ultra-pure water and process for using said ultra-pure water
US07/172,583 US4879041A (en) 1987-03-25 1988-03-24 Process for producing ultra-pure water and process for using said ultra-pure water
KR1019880003177A KR960003543B1 (ko) 1987-03-25 1988-03-24 초순수 제조방법 및 초순수 사용방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62139782A JPS63305917A (ja) 1987-06-05 1987-06-05 超純水製造方法及びその製造装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP4211238A Division JPH0757301B2 (ja) 1992-08-07 1992-08-07 半導体集積回路の洗浄方法及びその洗浄装置

Publications (2)

Publication Number Publication Date
JPS63305917A true JPS63305917A (ja) 1988-12-13
JPH0515486B2 JPH0515486B2 (enrdf_load_stackoverflow) 1993-03-01

Family

ID=15253296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62139782A Granted JPS63305917A (ja) 1987-03-25 1987-06-05 超純水製造方法及びその製造装置

Country Status (1)

Country Link
JP (1) JPS63305917A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0380982A (ja) * 1989-08-25 1991-04-05 Hitachi Zosen Corp 超純水製造用多重効用蒸留器における不純物除去装置
WO1993008931A3 (fr) * 1991-11-08 1993-06-10 Tadahiro Ohmi Systeme d'alimentation en eau ultrapure et procede de lavage de substrat, et systeme et procede de production d'eau ultrapure
JPH05329470A (ja) * 1992-05-28 1993-12-14 Ebara Corp 洗浄水製造装置
JP2009512549A (ja) * 2005-10-19 2009-03-26 シルバン ソース、 インク． 浄水システム
US7837877B2 (en) 2006-06-09 2010-11-23 Air Products And Chemicals, Inc. Process for separating components of a multi-component feed stream
WO2013094528A1 (ja) * 2011-12-20 2013-06-27 オルガノ株式会社 液体管理システム、および洗浄液の回収再生装置
JP2023164108A (ja) * 2022-04-28 2023-11-10 株式会社Sosui 水、その製造方法および製造システム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5855921U (ja) * 1981-10-12 1983-04-15 日立化成工業株式会社 発泡成形金型
JPS61293586A (ja) * 1985-06-20 1986-12-24 オ−ワイ・サンタサロ・ゾ−ルベルグ・エイビ− 水からの揮発性物質除去方法および装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5855921U (ja) * 1981-10-12 1983-04-15 日立化成工業株式会社 発泡成形金型
JPS61293586A (ja) * 1985-06-20 1986-12-24 オ−ワイ・サンタサロ・ゾ−ルベルグ・エイビ− 水からの揮発性物質除去方法および装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0380982A (ja) * 1989-08-25 1991-04-05 Hitachi Zosen Corp 超純水製造用多重効用蒸留器における不純物除去装置
WO1993008931A3 (fr) * 1991-11-08 1993-06-10 Tadahiro Ohmi Systeme d'alimentation en eau ultrapure et procede de lavage de substrat, et systeme et procede de production d'eau ultrapure
US5589005A (en) * 1991-11-08 1996-12-31 Ohmi; Tadahiro System for supplying ultrapure water and method of washing substrate, and system for producing ultrapure water and method of producing ultrapure water
JPH05329470A (ja) * 1992-05-28 1993-12-14 Ebara Corp 洗浄水製造装置
JP2009512549A (ja) * 2005-10-19 2009-03-26 シルバン ソース、 インク． 浄水システム
US7837877B2 (en) 2006-06-09 2010-11-23 Air Products And Chemicals, Inc. Process for separating components of a multi-component feed stream
WO2013094528A1 (ja) * 2011-12-20 2013-06-27 オルガノ株式会社 液体管理システム、および洗浄液の回収再生装置
JPWO2013094528A1 (ja) * 2011-12-20 2015-12-10 オルガノ株式会社 液体管理システムおよび液体管理方法
JP2023164108A (ja) * 2022-04-28 2023-11-10 株式会社Sosui 水、その製造方法および製造システム

Also Published As

Publication number Publication date
JPH0515486B2 (enrdf_load_stackoverflow) 1993-03-01

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