JPS63293168A - 酸化チタン薄膜の形成方法 - Google Patents

酸化チタン薄膜の形成方法

Info

Publication number
JPS63293168A
JPS63293168A JP12797287A JP12797287A JPS63293168A JP S63293168 A JPS63293168 A JP S63293168A JP 12797287 A JP12797287 A JP 12797287A JP 12797287 A JP12797287 A JP 12797287A JP S63293168 A JPS63293168 A JP S63293168A
Authority
JP
Japan
Prior art keywords
film
titanium oxide
temperature
thin film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12797287A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0349983B2 (2
Inventor
Akira Kawakatsu
晃 川勝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP12797287A priority Critical patent/JPS63293168A/ja
Publication of JPS63293168A publication Critical patent/JPS63293168A/ja
Publication of JPH0349983B2 publication Critical patent/JPH0349983B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Chemically Coating (AREA)
JP12797287A 1987-05-27 1987-05-27 酸化チタン薄膜の形成方法 Granted JPS63293168A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12797287A JPS63293168A (ja) 1987-05-27 1987-05-27 酸化チタン薄膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12797287A JPS63293168A (ja) 1987-05-27 1987-05-27 酸化チタン薄膜の形成方法

Publications (2)

Publication Number Publication Date
JPS63293168A true JPS63293168A (ja) 1988-11-30
JPH0349983B2 JPH0349983B2 (2) 1991-07-31

Family

ID=14973246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12797287A Granted JPS63293168A (ja) 1987-05-27 1987-05-27 酸化チタン薄膜の形成方法

Country Status (1)

Country Link
JP (1) JPS63293168A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2460877A (en) * 2008-06-13 2009-12-16 Ceres Ip Co Ltd Method of depositing crystalline ceramic films
US9561987B2 (en) 2008-06-13 2017-02-07 Ceres Intellectual Property Company Limited Method for deposition of ceramic films

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2460877A (en) * 2008-06-13 2009-12-16 Ceres Ip Co Ltd Method of depositing crystalline ceramic films
US9561987B2 (en) 2008-06-13 2017-02-07 Ceres Intellectual Property Company Limited Method for deposition of ceramic films

Also Published As

Publication number Publication date
JPH0349983B2 (2) 1991-07-31

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