JPS63273205A - 磁気ヘツドのスパツタリング方法 - Google Patents
磁気ヘツドのスパツタリング方法Info
- Publication number
- JPS63273205A JPS63273205A JP10624687A JP10624687A JPS63273205A JP S63273205 A JPS63273205 A JP S63273205A JP 10624687 A JP10624687 A JP 10624687A JP 10624687 A JP10624687 A JP 10624687A JP S63273205 A JPS63273205 A JP S63273205A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic head
- sputtering
- stress
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 47
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 37
- 239000010409 thin film Substances 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000002184 metal Substances 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 24
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000012544 monitoring process Methods 0.000 claims abstract description 7
- 238000005452 bending Methods 0.000 claims description 5
- 229910000702 sendust Inorganic materials 0.000 claims description 4
- 238000000137 annealing Methods 0.000 abstract description 29
- 230000035699 permeability Effects 0.000 abstract description 9
- 239000010408 film Substances 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910001257 Nb alloy Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000005307 ferromagnetism Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Magnetic Heads (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10624687A JPS63273205A (ja) | 1987-05-01 | 1987-05-01 | 磁気ヘツドのスパツタリング方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10624687A JPS63273205A (ja) | 1987-05-01 | 1987-05-01 | 磁気ヘツドのスパツタリング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63273205A true JPS63273205A (ja) | 1988-11-10 |
| JPH0519763B2 JPH0519763B2 (https=) | 1993-03-17 |
Family
ID=14428752
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10624687A Granted JPS63273205A (ja) | 1987-05-01 | 1987-05-01 | 磁気ヘツドのスパツタリング方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63273205A (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06132554A (ja) * | 1991-01-29 | 1994-05-13 | Optical Coating Lab Inc | 薄膜コーティング及びその形成法 |
| US5507870A (en) * | 1991-12-06 | 1996-04-16 | Hughes Aircraft Company | Optical coatings having a plurality of prescribed properties and methods of fabricating same |
| US6181520B1 (en) * | 1997-07-04 | 2001-01-30 | Fujitsu Limited | Head slider and disk unit having contact detection means |
-
1987
- 1987-05-01 JP JP10624687A patent/JPS63273205A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06132554A (ja) * | 1991-01-29 | 1994-05-13 | Optical Coating Lab Inc | 薄膜コーティング及びその形成法 |
| US5507870A (en) * | 1991-12-06 | 1996-04-16 | Hughes Aircraft Company | Optical coatings having a plurality of prescribed properties and methods of fabricating same |
| US6181520B1 (en) * | 1997-07-04 | 2001-01-30 | Fujitsu Limited | Head slider and disk unit having contact detection means |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0519763B2 (https=) | 1993-03-17 |
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