JPS6327046A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6327046A
JPS6327046A JP17020386A JP17020386A JPS6327046A JP S6327046 A JPS6327046 A JP S6327046A JP 17020386 A JP17020386 A JP 17020386A JP 17020386 A JP17020386 A JP 17020386A JP S6327046 A JPS6327046 A JP S6327046A
Authority
JP
Japan
Prior art keywords
resistance
elements
width
resistor
mask pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17020386A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0511669B2 (enrdf_load_stackoverflow
Inventor
Atsushi Kishi
岸　淳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP17020386A priority Critical patent/JPS6327046A/ja
Publication of JPS6327046A publication Critical patent/JPS6327046A/ja
Publication of JPH0511669B2 publication Critical patent/JPH0511669B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Semiconductor Integrated Circuits (AREA)
JP17020386A 1986-07-18 1986-07-18 半導体装置の製造方法 Granted JPS6327046A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17020386A JPS6327046A (ja) 1986-07-18 1986-07-18 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17020386A JPS6327046A (ja) 1986-07-18 1986-07-18 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6327046A true JPS6327046A (ja) 1988-02-04
JPH0511669B2 JPH0511669B2 (enrdf_load_stackoverflow) 1993-02-16

Family

ID=15900577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17020386A Granted JPS6327046A (ja) 1986-07-18 1986-07-18 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6327046A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013062422A (ja) * 2011-09-14 2013-04-04 Rohm Co Ltd 半導体集積回路

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013062422A (ja) * 2011-09-14 2013-04-04 Rohm Co Ltd 半導体集積回路

Also Published As

Publication number Publication date
JPH0511669B2 (enrdf_load_stackoverflow) 1993-02-16

Similar Documents

Publication Publication Date Title
US5552718A (en) Electrical test structure and method for space and line measurement
JPS6327046A (ja) 半導体装置の製造方法
JPS62102531A (ja) エツチング方法
JP3237904B2 (ja) セラミック多層基板の製造方法
JPS6031263A (ja) 半導体集積回路装置
JPH022295B2 (enrdf_load_stackoverflow)
JPH02122545A (ja) セミカスタム半導体集積回路の設計方法
JPH0997876A (ja) 半導体装置及びその製造方法
JP2853471B2 (ja) 半導体集積回路装置の製造方法
JP3449300B2 (ja) 基板上に形成された回路のトリミング方法
JP2687469B2 (ja) 半導体装置
JPH05235279A (ja) 半導体集積回路装置
JPS6221260A (ja) 半導体装置の製造方法
JPS6352783B2 (enrdf_load_stackoverflow)
JPS6347924A (ja) 半導体装置の製造方法
JPS5947463B2 (ja) 半導体集積回路装置
JPH0226789B2 (enrdf_load_stackoverflow)
JPS62194628A (ja) 半導体装置の製造方法
JPS6348420B2 (enrdf_load_stackoverflow)
JP2534496B2 (ja) 半導体装置の製造方法
JPS62188228A (ja) 集積回路の製造方法
JP3164097B2 (ja) 半導体集積回路装置及び半導体集積回路製造方法
JPH01151289A (ja) 電子部品装置
JPH0310234B2 (enrdf_load_stackoverflow)
JPH01228159A (ja) 半導体装置およびその製造方法