JPH022296B2 - - Google Patents

Info

Publication number
JPH022296B2
JPH022296B2 JP57050405A JP5040582A JPH022296B2 JP H022296 B2 JPH022296 B2 JP H022296B2 JP 57050405 A JP57050405 A JP 57050405A JP 5040582 A JP5040582 A JP 5040582A JP H022296 B2 JPH022296 B2 JP H022296B2
Authority
JP
Japan
Prior art keywords
pattern
resistor
resistance
elements
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57050405A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5821365A (ja
Inventor
Ichiuemon Sasaki
Isamu Takashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP57050405A priority Critical patent/JPS5821365A/ja
Publication of JPS5821365A publication Critical patent/JPS5821365A/ja
Publication of JPH022296B2 publication Critical patent/JPH022296B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/201—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
    • H10D84/204—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
    • H10D84/209—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only resistors

Landscapes

  • Formation Of Insulating Films (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP57050405A 1982-03-29 1982-03-29 半導体集積回路装置 Granted JPS5821365A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57050405A JPS5821365A (ja) 1982-03-29 1982-03-29 半導体集積回路装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57050405A JPS5821365A (ja) 1982-03-29 1982-03-29 半導体集積回路装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP48097567A Division JPS5947463B2 (ja) 1973-08-29 1973-08-29 半導体集積回路装置

Publications (2)

Publication Number Publication Date
JPS5821365A JPS5821365A (ja) 1983-02-08
JPH022296B2 true JPH022296B2 (enrdf_load_stackoverflow) 1990-01-17

Family

ID=12857949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57050405A Granted JPS5821365A (ja) 1982-03-29 1982-03-29 半導体集積回路装置

Country Status (1)

Country Link
JP (1) JPS5821365A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6180519U (enrdf_load_stackoverflow) * 1984-10-31 1986-05-29
JP3028420B2 (ja) * 1988-09-05 2000-04-04 セイコーエプソン株式会社 半導体集積装置
JPH0521718A (ja) * 1991-07-10 1993-01-29 Mitsubishi Electric Corp Ｒ−２ｒラダー抵抗装置

Also Published As

Publication number Publication date
JPS5821365A (ja) 1983-02-08

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