JPS6325519B2 - - Google Patents

Info

Publication number
JPS6325519B2
JPS6325519B2 JP53080494A JP8049478A JPS6325519B2 JP S6325519 B2 JPS6325519 B2 JP S6325519B2 JP 53080494 A JP53080494 A JP 53080494A JP 8049478 A JP8049478 A JP 8049478A JP S6325519 B2 JPS6325519 B2 JP S6325519B2
Authority
JP
Japan
Prior art keywords
wiring layer
forming
layer
insulating film
connection layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53080494A
Other languages
English (en)
Japanese (ja)
Other versions
JPS558054A (en
Inventor
Mitsuaki Morikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Noritake Itron Corp
Original Assignee
Ise Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ise Electronics Corp filed Critical Ise Electronics Corp
Priority to JP8049478A priority Critical patent/JPS558054A/ja
Publication of JPS558054A publication Critical patent/JPS558054A/ja
Publication of JPS6325519B2 publication Critical patent/JPS6325519B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
JP8049478A 1978-07-04 1978-07-04 Method of manufacturing multiilayer wiring layer Granted JPS558054A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8049478A JPS558054A (en) 1978-07-04 1978-07-04 Method of manufacturing multiilayer wiring layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8049478A JPS558054A (en) 1978-07-04 1978-07-04 Method of manufacturing multiilayer wiring layer

Publications (2)

Publication Number Publication Date
JPS558054A JPS558054A (en) 1980-01-21
JPS6325519B2 true JPS6325519B2 (US06878557-20050412-C00065.png) 1988-05-25

Family

ID=13719845

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8049478A Granted JPS558054A (en) 1978-07-04 1978-07-04 Method of manufacturing multiilayer wiring layer

Country Status (1)

Country Link
JP (1) JPS558054A (US06878557-20050412-C00065.png)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003173929A (ja) * 2001-09-26 2003-06-20 Mitsui Mining & Smelting Co Ltd キャパシタ層形成用の積層板及びその製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4998587A (US06878557-20050412-C00065.png) * 1973-01-22 1974-09-18

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4998587A (US06878557-20050412-C00065.png) * 1973-01-22 1974-09-18

Also Published As

Publication number Publication date
JPS558054A (en) 1980-01-21

Similar Documents

Publication Publication Date Title
JPS6222247B2 (US06878557-20050412-C00065.png)
JP2821623B2 (ja) 半導体装置の製造方法
JPS6325519B2 (US06878557-20050412-C00065.png)
JP3126862B2 (ja) 金属パターンの形成方法
GB2283614A (en) Method for manufacture of multilayer wiring board
JP3040500B2 (ja) 半導体装置の製造方法
JPS6155797B2 (US06878557-20050412-C00065.png)
JPH0245996A (ja) 混成集積回路の製造方法
JPH07307550A (ja) 電子部品の製造方法
JPS6261334A (ja) パタ−ンの形成方法
JPS6097691A (ja) 厚膜薄膜配線基板の製造方法
JP3036038B2 (ja) 半導体装置の製造方法
JPS5841775B2 (ja) ハンドウタイソウチノセイゾウホウホウ
JPS58210168A (ja) 二層膜のエツチング方法
JPS6362104B2 (US06878557-20050412-C00065.png)
JPS6074489A (ja) 超伝導グランドコンタクトの形成方法
JPH05308182A (ja) 膜回路基板の製造方法
JPH05102160A (ja) 半導体装置およびその製造方法
JPS6046049A (ja) 半導体装置の製造方法
JPH0587038B2 (US06878557-20050412-C00065.png)
JPH04348592A (ja) 薄膜回路基板の製造方法
JPH0897242A (ja) 半導体装置の製造方法
JPS594876B2 (ja) 厚膜回路基板およびその製法
JPS5893398A (ja) 配線基板の製造方法
JPH03291936A (ja) 半導体装置の製造方法