JPS6320910B2 - - Google Patents

Info

Publication number
JPS6320910B2
JPS6320910B2 JP59122418A JP12241884A JPS6320910B2 JP S6320910 B2 JPS6320910 B2 JP S6320910B2 JP 59122418 A JP59122418 A JP 59122418A JP 12241884 A JP12241884 A JP 12241884A JP S6320910 B2 JPS6320910 B2 JP S6320910B2
Authority
JP
Japan
Prior art keywords
container
taper
side wall
evaporation
evaporation source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59122418A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6017071A (ja
Inventor
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP12241884A priority Critical patent/JPS6017071A/ja
Publication of JPS6017071A publication Critical patent/JPS6017071A/ja
Publication of JPS6320910B2 publication Critical patent/JPS6320910B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
JP12241884A 1984-06-14 1984-06-14 蒸発源用容器 Granted JPS6017071A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12241884A JPS6017071A (ja) 1984-06-14 1984-06-14 蒸発源用容器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12241884A JPS6017071A (ja) 1984-06-14 1984-06-14 蒸発源用容器

Publications (2)

Publication Number Publication Date
JPS6017071A JPS6017071A (ja) 1985-01-28
JPS6320910B2 true JPS6320910B2 (enrdf_load_stackoverflow) 1988-05-02

Family

ID=14835332

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12241884A Granted JPS6017071A (ja) 1984-06-14 1984-06-14 蒸発源用容器

Country Status (1)

Country Link
JP (1) JPS6017071A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN209619438U (zh) * 2019-01-17 2019-11-12 云谷(固安)科技有限公司 一种点蒸发源以及蒸镀设备

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5333873B2 (enrdf_load_stackoverflow) * 1973-03-16 1978-09-18
JPS51151684A (en) * 1975-06-23 1976-12-27 Fuji Xerox Co Ltd Evaporating source for vacuum evaporation

Also Published As

Publication number Publication date
JPS6017071A (ja) 1985-01-28

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