JPS6017071A - 蒸発源用容器 - Google Patents

蒸発源用容器

Info

Publication number
JPS6017071A
JPS6017071A JP12241884A JP12241884A JPS6017071A JP S6017071 A JPS6017071 A JP S6017071A JP 12241884 A JP12241884 A JP 12241884A JP 12241884 A JP12241884 A JP 12241884A JP S6017071 A JPS6017071 A JP S6017071A
Authority
JP
Japan
Prior art keywords
vessel
containing part
evaporating source
side wall
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12241884A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6320910B2 (enrdf_load_stackoverflow
Inventor
Koichi Shinohara
紘一 篠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP12241884A priority Critical patent/JPS6017071A/ja
Publication of JPS6017071A publication Critical patent/JPS6017071A/ja
Publication of JPS6320910B2 publication Critical patent/JPS6320910B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
JP12241884A 1984-06-14 1984-06-14 蒸発源用容器 Granted JPS6017071A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12241884A JPS6017071A (ja) 1984-06-14 1984-06-14 蒸発源用容器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12241884A JPS6017071A (ja) 1984-06-14 1984-06-14 蒸発源用容器

Publications (2)

Publication Number Publication Date
JPS6017071A true JPS6017071A (ja) 1985-01-28
JPS6320910B2 JPS6320910B2 (enrdf_load_stackoverflow) 1988-05-02

Family

ID=14835332

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12241884A Granted JPS6017071A (ja) 1984-06-14 1984-06-14 蒸発源用容器

Country Status (1)

Country Link
JP (1) JPS6017071A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020147273A1 (zh) * 2019-01-17 2020-07-23 云谷（固安）科技有限公司 一种点蒸发源以及蒸镀设备

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49119663A (enrdf_load_stackoverflow) * 1973-03-16 1974-11-15
JPS51151684A (en) * 1975-06-23 1976-12-27 Fuji Xerox Co Ltd Evaporating source for vacuum evaporation

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49119663A (enrdf_load_stackoverflow) * 1973-03-16 1974-11-15
JPS51151684A (en) * 1975-06-23 1976-12-27 Fuji Xerox Co Ltd Evaporating source for vacuum evaporation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020147273A1 (zh) * 2019-01-17 2020-07-23 云谷（固安）科技有限公司 一种点蒸发源以及蒸镀设备

Also Published As

Publication number Publication date
JPS6320910B2 (enrdf_load_stackoverflow) 1988-05-02

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