JPS6320383B2 - - Google Patents

Info

Publication number
JPS6320383B2
JPS6320383B2 JP56130521A JP13052181A JPS6320383B2 JP S6320383 B2 JPS6320383 B2 JP S6320383B2 JP 56130521 A JP56130521 A JP 56130521A JP 13052181 A JP13052181 A JP 13052181A JP S6320383 B2 JPS6320383 B2 JP S6320383B2
Authority
JP
Japan
Prior art keywords
oxide film
silicon oxide
insulating film
film
smoothing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56130521A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5832434A (ja
Inventor
Shigeru Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP13052181A priority Critical patent/JPS5832434A/ja
Publication of JPS5832434A publication Critical patent/JPS5832434A/ja
Publication of JPS6320383B2 publication Critical patent/JPS6320383B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP13052181A 1981-08-20 1981-08-20 半導体装置の製造方法 Granted JPS5832434A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13052181A JPS5832434A (ja) 1981-08-20 1981-08-20 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13052181A JPS5832434A (ja) 1981-08-20 1981-08-20 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5832434A JPS5832434A (ja) 1983-02-25
JPS6320383B2 true JPS6320383B2 (enrdf_load_stackoverflow) 1988-04-27

Family

ID=15036281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13052181A Granted JPS5832434A (ja) 1981-08-20 1981-08-20 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5832434A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60111470A (ja) * 1983-11-22 1985-06-17 Fujitsu Ltd 半導体装置の製造方法
JP2512900B2 (ja) * 1986-05-22 1996-07-03 三菱電機株式会社 半導体装置の製造方法
US5420077A (en) * 1990-06-29 1995-05-30 Sharp Kabushiki Kaisha Method for forming a wiring layer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221785A (en) * 1975-08-13 1977-02-18 Toshiba Corp Unit and production system for semiconductor
JPS52102691A (en) * 1976-02-25 1977-08-29 Hitachi Ltd Formation of wiring on insulating layer having steps
JPS5324277A (en) * 1976-08-18 1978-03-06 Nec Corp Semiconductor devic e and its production

Also Published As

Publication number Publication date
JPS5832434A (ja) 1983-02-25

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