JPS6319856B2 - - Google Patents
Info
- Publication number
- JPS6319856B2 JPS6319856B2 JP21167584A JP21167584A JPS6319856B2 JP S6319856 B2 JPS6319856 B2 JP S6319856B2 JP 21167584 A JP21167584 A JP 21167584A JP 21167584 A JP21167584 A JP 21167584A JP S6319856 B2 JPS6319856 B2 JP S6319856B2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- ion
- pattern
- shape
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 33
- 150000002500 ions Chemical class 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 14
- 239000003086 colorant Substances 0.000 claims description 8
- 201000009310 astigmatism Diseases 0.000 claims description 7
- 238000001514 detection method Methods 0.000 claims description 4
- 230000007547 defect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
- G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59211675A JPS6190161A (ja) | 1984-10-09 | 1984-10-09 | 集束イオンビ−ムのビ−ム形状調整方法 |
US06/783,247 US4704526A (en) | 1984-10-09 | 1985-10-02 | Apparatus of regulating shape of focused ion beams |
DE8585307089T DE3572889D1 (en) | 1984-10-09 | 1985-10-03 | Apparatus for and method of regulating the shape of a focused ion beam |
EP85307089A EP0178129B1 (en) | 1984-10-09 | 1985-10-03 | Apparatus for and method of regulating the shape of a focused ion beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59211675A JPS6190161A (ja) | 1984-10-09 | 1984-10-09 | 集束イオンビ−ムのビ−ム形状調整方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6190161A JPS6190161A (ja) | 1986-05-08 |
JPS6319856B2 true JPS6319856B2 (US06521211-20030218-C00004.png) | 1988-04-25 |
Family
ID=16609728
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59211675A Granted JPS6190161A (ja) | 1984-10-09 | 1984-10-09 | 集束イオンビ−ムのビ−ム形状調整方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4704526A (US06521211-20030218-C00004.png) |
EP (1) | EP0178129B1 (US06521211-20030218-C00004.png) |
JP (1) | JPS6190161A (US06521211-20030218-C00004.png) |
DE (1) | DE3572889D1 (US06521211-20030218-C00004.png) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63138559U (US06521211-20030218-C00004.png) * | 1987-03-03 | 1988-09-12 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05251039A (ja) * | 1992-03-04 | 1993-09-28 | Ebara Corp | 二次イオン質量分析計 |
FR2823005B1 (fr) * | 2001-03-28 | 2003-05-16 | Centre Nat Rech Scient | Dispositif de generation d'un faisceau d'ions et procede de reglage de ce faisceau |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3628014A (en) * | 1969-12-22 | 1971-12-14 | Boeing Co | Scanning electron microscope with color display means |
US3772520A (en) * | 1972-03-21 | 1973-11-13 | Us Air Force | Method for the investigation of thin films on a semiconductor substrate in a scanning electron microscope |
US4041311A (en) * | 1976-07-12 | 1977-08-09 | Iowa State University Research Foundation, Inc. | Scanning electron microscope with color image display |
JPS5481075A (en) * | 1977-11-24 | 1979-06-28 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of detecting article image using electron beam |
US4560872A (en) * | 1981-09-01 | 1985-12-24 | Commonwealth Scientific And Industrial Research Organization | Method and apparatus for image formation |
JPS5856332A (ja) * | 1981-09-30 | 1983-04-04 | Hitachi Ltd | マスクの欠陥修正方法 |
JPS5918555A (ja) * | 1982-07-22 | 1984-01-30 | Erionikusu:Kk | 荷電粒子線取扱方法および装置 |
US4588890A (en) * | 1984-12-31 | 1986-05-13 | International Business Machines Corporation | Apparatus and method for composite image formation by scanning electron beam |
-
1984
- 1984-10-09 JP JP59211675A patent/JPS6190161A/ja active Granted
-
1985
- 1985-10-02 US US06/783,247 patent/US4704526A/en not_active Expired - Lifetime
- 1985-10-03 DE DE8585307089T patent/DE3572889D1/de not_active Expired
- 1985-10-03 EP EP85307089A patent/EP0178129B1/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63138559U (US06521211-20030218-C00004.png) * | 1987-03-03 | 1988-09-12 |
Also Published As
Publication number | Publication date |
---|---|
US4704526A (en) | 1987-11-03 |
EP0178129B1 (en) | 1989-09-06 |
EP0178129A3 (en) | 1988-01-20 |
JPS6190161A (ja) | 1986-05-08 |
EP0178129A2 (en) | 1986-04-16 |
DE3572889D1 (en) | 1989-10-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
EXPY | Cancellation because of completion of term |