JPS631742B2 - - Google Patents

Info

Publication number
JPS631742B2
JPS631742B2 JP55126813A JP12681380A JPS631742B2 JP S631742 B2 JPS631742 B2 JP S631742B2 JP 55126813 A JP55126813 A JP 55126813A JP 12681380 A JP12681380 A JP 12681380A JP S631742 B2 JPS631742 B2 JP S631742B2
Authority
JP
Japan
Prior art keywords
stage
electron beam
amount
movement
drawn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55126813A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5750432A (en
Inventor
Teruaki Okino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP55126813A priority Critical patent/JPS5750432A/ja
Publication of JPS5750432A publication Critical patent/JPS5750432A/ja
Publication of JPS631742B2 publication Critical patent/JPS631742B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP55126813A 1980-09-12 1980-09-12 Drawing method by electron beam Granted JPS5750432A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55126813A JPS5750432A (en) 1980-09-12 1980-09-12 Drawing method by electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55126813A JPS5750432A (en) 1980-09-12 1980-09-12 Drawing method by electron beam

Publications (2)

Publication Number Publication Date
JPS5750432A JPS5750432A (en) 1982-03-24
JPS631742B2 true JPS631742B2 (enExample) 1988-01-13

Family

ID=14944588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55126813A Granted JPS5750432A (en) 1980-09-12 1980-09-12 Drawing method by electron beam

Country Status (1)

Country Link
JP (1) JPS5750432A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5982725A (ja) * 1982-11-04 1984-05-12 Hitachi Ltd 電子線描画装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846847B2 (ja) * 1976-11-09 1983-10-19 富士通株式会社 電子ビ−ム露光装置
JPS5928981B2 (ja) * 1978-12-11 1984-07-17 富士通株式会社 電子ビ−ム露光方式

Also Published As

Publication number Publication date
JPS5750432A (en) 1982-03-24

Similar Documents

Publication Publication Date Title
US6859260B2 (en) Method and system for improving focus accuracy in a lithography system
KR970051941A (ko) 직교도 측정 방법과 스테이지 장치 및 노광 장치
JP2000049066A (ja) 露光装置およびデバイス製造方法
US6583430B1 (en) Electron beam exposure method and apparatus
CN109100920A (zh) 曝光装置以及物品的制造方法
JP2960746B2 (ja) ビーム照射方法および電子ビーム描画方法とビーム照射装置並びに電子ビーム描画装置
JPH09223650A (ja) 露光装置
US5523574A (en) Exposure apparatus
JPS63140989A (ja) 位置決め装置
US5798530A (en) Method and apparatus for aligning a mask and a set of substrates to be exposed
JPS631742B2 (enExample)
JPS62150106A (ja) 位置検出装置
KR100670072B1 (ko) 다수의 간섭계 빔을 사용하는 레티클 초점 측정 시스템 및방법
JPH0982610A (ja) 露光方法及び装置
EP0654813A1 (en) Electron beam drawing apparatus and method of drawing with such apparatus
JP2646417B2 (ja) 露光装置
JPH10289847A (ja) 荷電粒子ビーム露光方法及びシステム
JP3232583B2 (ja) 電子線描画装置
JPH0782390B2 (ja) ステージ位置決め方法
JPH11132762A (ja) 走査型露光装置の長尺鏡の平面度差の測定方法
JPH11295186A (ja) 露光に用いるレンズの評価方法、及び同装置
JPH10242248A (ja) 移動ステージの位置測定方法と装置
JP2621179B2 (ja) アライメント方法
JP2000100704A (ja) 走査型露光装置と走査型露光方法
JPH0573934U (ja) 露光装置