JPS6317300A - 石英ガラス製炉芯管 - Google Patents

石英ガラス製炉芯管

Info

Publication number
JPS6317300A
JPS6317300A JP61160608A JP16060886A JPS6317300A JP S6317300 A JPS6317300 A JP S6317300A JP 61160608 A JP61160608 A JP 61160608A JP 16060886 A JP16060886 A JP 16060886A JP S6317300 A JPS6317300 A JP S6317300A
Authority
JP
Japan
Prior art keywords
furnace core
quartz glass
core tube
furnace
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61160608A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0468279B2 (enExample
Inventor
Kyoichi Inagi
恭一 稲木
Hiroshi Kimura
博至 木村
Kazuo Nakamura
一雄 中村
Katsuhiko Kenmochi
克彦 剣持
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Quartz Products Co Ltd
Priority to JP61160608A priority Critical patent/JPS6317300A/ja
Priority to KR1019870001654A priority patent/KR900003251B1/ko
Publication of JPS6317300A publication Critical patent/JPS6317300A/ja
Publication of JPH0468279B2 publication Critical patent/JPH0468279B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Chamber type furnaces specially adapted for treating semiconductor wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
  • Joining Of Glass To Other Materials (AREA)
JP61160608A 1986-07-08 1986-07-08 石英ガラス製炉芯管 Granted JPS6317300A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP61160608A JPS6317300A (ja) 1986-07-08 1986-07-08 石英ガラス製炉芯管
KR1019870001654A KR900003251B1 (ko) 1986-07-08 1987-02-26 석영유리제 노심관

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61160608A JPS6317300A (ja) 1986-07-08 1986-07-08 石英ガラス製炉芯管

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP5782594A Division JPH0774122A (ja) 1994-03-28 1994-03-28 石英ガラス製の炉芯管
JP5777494A Division JPH0774121A (ja) 1994-03-28 1994-03-28 石英ガラス製炉芯管

Publications (2)

Publication Number Publication Date
JPS6317300A true JPS6317300A (ja) 1988-01-25
JPH0468279B2 JPH0468279B2 (enExample) 1992-10-30

Family

ID=15718619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61160608A Granted JPS6317300A (ja) 1986-07-08 1986-07-08 石英ガラス製炉芯管

Country Status (2)

Country Link
JP (1) JPS6317300A (enExample)
KR (1) KR900003251B1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01162234U (enExample) * 1988-04-26 1989-11-10
JPH1053499A (ja) * 1996-08-07 1998-02-24 Yamagata Shinetsu Sekiei:Kk ウエーハ熱処理装置及びそのウエーハ装填方法
JPH10163122A (ja) * 1996-11-29 1998-06-19 Fukui Shinetsu Sekiei:Kk 半導体ウエハの熱処理装置及び炉心管
JP2005526370A (ja) * 2001-05-14 2005-09-02 セムコ エンジニアリング エス．アー． 減圧下でのシリコンウェーハのドーピング、拡散、および酸化の方法と装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01162234U (enExample) * 1988-04-26 1989-11-10
JPH1053499A (ja) * 1996-08-07 1998-02-24 Yamagata Shinetsu Sekiei:Kk ウエーハ熱処理装置及びそのウエーハ装填方法
JPH10163122A (ja) * 1996-11-29 1998-06-19 Fukui Shinetsu Sekiei:Kk 半導体ウエハの熱処理装置及び炉心管
JP2005526370A (ja) * 2001-05-14 2005-09-02 セムコ エンジニアリング エス．アー． 減圧下でのシリコンウェーハのドーピング、拡散、および酸化の方法と装置

Also Published As

Publication number Publication date
KR880002240A (ko) 1988-04-29
KR900003251B1 (ko) 1990-05-12
JPH0468279B2 (enExample) 1992-10-30

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