JPS6313343B2 - - Google Patents
Info
- Publication number
- JPS6313343B2 JPS6313343B2 JP56036382A JP3638281A JPS6313343B2 JP S6313343 B2 JPS6313343 B2 JP S6313343B2 JP 56036382 A JP56036382 A JP 56036382A JP 3638281 A JP3638281 A JP 3638281A JP S6313343 B2 JPS6313343 B2 JP S6313343B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- film
- substrate
- vapor deposition
- nitrogen compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3638281A JPS57152132A (en) | 1981-03-13 | 1981-03-13 | Chemical vapor growing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3638281A JPS57152132A (en) | 1981-03-13 | 1981-03-13 | Chemical vapor growing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57152132A JPS57152132A (en) | 1982-09-20 |
JPS6313343B2 true JPS6313343B2 (enrdf_load_stackoverflow) | 1988-03-25 |
Family
ID=12468291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3638281A Granted JPS57152132A (en) | 1981-03-13 | 1981-03-13 | Chemical vapor growing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57152132A (enrdf_load_stackoverflow) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5279448A (en) * | 1975-12-25 | 1977-07-04 | Toyota Motor Corp | Fixing device for tiltable handwheel |
JPS5996736A (ja) * | 1982-11-26 | 1984-06-04 | Hitachi Ltd | 半導体装置 |
JPS61145834A (ja) * | 1984-12-20 | 1986-07-03 | Toshiba Corp | 半導体装置の製造方法 |
JPS61256735A (ja) * | 1985-05-10 | 1986-11-14 | Nec Corp | 半導体装置及びその製造方法 |
JPS62166530A (ja) * | 1986-01-20 | 1987-07-23 | Toshiba Corp | 半導体装置の製造方法 |
JP2659193B2 (ja) * | 1987-08-20 | 1997-09-30 | 日本電気株式会社 | 半導体装置 |
-
1981
- 1981-03-13 JP JP3638281A patent/JPS57152132A/ja active Granted
Non-Patent Citations (1)
Title |
---|
SOLID-STATE SCIENCE AND TECHNOLOGY=1977 * |
Also Published As
Publication number | Publication date |
---|---|
JPS57152132A (en) | 1982-09-20 |
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