JPS63121434U - - Google Patents
Info
- Publication number
- JPS63121434U JPS63121434U JP1353587U JP1353587U JPS63121434U JP S63121434 U JPS63121434 U JP S63121434U JP 1353587 U JP1353587 U JP 1353587U JP 1353587 U JP1353587 U JP 1353587U JP S63121434 U JPS63121434 U JP S63121434U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- notch
- holding part
- rotary coating
- rotates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 238000004528 spin coating Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
Description
第１図〜第６図は本考案の回転塗布装置の一実
施例を示す図であり、第１図は平面図、第２図は
正面図、第３図は第１図のＸ１―Ｘ１線断面図、
第４図は第１図のＹ１―Ｙ１線断面図、第５図及
び第６図はそれぞれ基板に支持部が当接したとき
の、Ｘ１―Ｘ１線断面図及びＹ１―Ｙ１線断面図
である。第７図及び第８図は従来の回転塗布装置
を示す図であり、第７図は平面図、第８図は正面
図である。第９図は従来の回転塗布装置によつて
レジスト膜を塗布したときのレジストの糸状物を
示す基板の平面図である。
２０…基板、２０ａ，２０ｂ…側面、２０ｃ…
角部、２１…保持部、２１ａ…切欠部、２２…搬
送部、２２ａ，２２ｂ…支持部、２３…回転用軸
。
1 to 6 are diagrams showing one embodiment of the spin coating apparatus of the present invention, in which FIG. 1 is a plan view, FIG. 2 is a front view, and FIG . 1- line sectional view,
FIG. 4 is a sectional view taken along the line Y 1 - Y 1 in FIG. 1, and FIGS. 5 and 6 are sectional views taken along the line X 1 - It is a 1- line sectional view. FIGS. 7 and 8 are views showing a conventional spin coating device, with FIG. 7 being a plan view and FIG. 8 being a front view. FIG. 9 is a plan view of a substrate showing filaments of resist when a resist film is applied by a conventional spin coating device. 20...Substrate, 20a, 20b...Side surface, 20c...
Corner part, 21... Holding part, 21a... Notch part, 22... Conveyance part, 22a, 22b... Support part, 23... Rotation shaft.
Claims (1)
させる保持部と、前記基板を搬送する搬送部とを
具備する回転塗布装置において、前記保持部が、
その直径が前記基板の主表面の対角線寸法以上の
寸法である円板であり、かつ前記保持部に前記基
板を保持したとき、前記基板の２側面により形成
される角部近傍の下に位置し、その位置から前記
保持部の側面まで切り取られた切欠部を有し、さ
らに前記搬送部が、前記切欠部を通し、かつ搬送
のときに前記基板を支持する支持部を備えている
ことを特徴とする回転塗布装置。 (2) 実用新案登録請求の範囲第(1)項記載におい
て、前記切欠部が、前記角部を形成する２側面の
うち、前記基板が回転する方向の後方の側面の下
に設けられていることを特徴とする回転塗布装置
。[Claims for Utility Model Registration] (1) A rotary coating device comprising a holding part that holds and rotates a substrate to be coated with a resist film, and a conveyance part that conveys the substrate, wherein the holding part comprises:
A circular plate whose diameter is equal to or larger than the diagonal dimension of the main surface of the substrate, and which is located below near a corner formed by two side surfaces of the substrate when the substrate is held in the holding part. , the substrate has a notch cut out from the position to a side surface of the holding portion, and the conveying portion further includes a support portion that passes through the notch and supports the substrate during conveyance. Rotary coating equipment. (2) In the utility model registration claim (1), the notch is provided under the rear side in the direction in which the substrate rotates, of the two side surfaces forming the corner. A rotary coating device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1353587U JPH0331073Y2 (en) | 1987-01-30 | 1987-01-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1353587U JPH0331073Y2 (en) | 1987-01-30 | 1987-01-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63121434U true JPS63121434U (en) | 1988-08-05 |
| JPH0331073Y2 JPH0331073Y2 (en) | 1991-07-01 |
Family
ID=30802683
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1353587U Expired JPH0331073Y2 (en) | 1987-01-30 | 1987-01-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0331073Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007305614A (en) * | 2006-05-08 | 2007-11-22 | Tokyo Electron Ltd | Substrate warpage measuring apparatus and substrate processing system |
-
1987
- 1987-01-30 JP JP1353587U patent/JPH0331073Y2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007305614A (en) * | 2006-05-08 | 2007-11-22 | Tokyo Electron Ltd | Substrate warpage measuring apparatus and substrate processing system |
| JP4642692B2 (en) * | 2006-05-08 | 2011-03-02 | 東京エレクトロン株式会社 | Substrate processing system |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0331073Y2 (en) | 1991-07-01 |
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