JPS63900U - - Google Patents
Info
- Publication number
- JPS63900U JPS63900U JP9330786U JP9330786U JPS63900U JP S63900 U JPS63900 U JP S63900U JP 9330786 U JP9330786 U JP 9330786U JP 9330786 U JP9330786 U JP 9330786U JP S63900 U JPS63900 U JP S63900U
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- substrate
- contact
- peeled
- disposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 2
Landscapes
- Coating Apparatus (AREA)
Description
第1図は本考案の一実施例について構成の要部
を示す斜視図、第2図は角形基板に塗着形成した
レジスト膜の膜厚状態を模写的に示す断面図であ
る。
1……基板、3……回転可能なテーブル、4…
…回転駆動源、6′……第一の移動機構、7……
レジスト膜剥離手段、14,17……第二の移動
機構、18……乾燥手段。
FIG. 1 is a perspective view showing the main parts of an embodiment of the present invention, and FIG. 2 is a cross-sectional view schematically showing the thickness of a resist film applied and formed on a rectangular substrate. 1... Board, 3... Rotatable table, 4...
...Rotary drive source, 6'...First moving mechanism, 7...
Resist film peeling means, 14, 17...second moving mechanism, 18...drying means.
Claims (1)
可能なテーブルと、前記テーブルを回転する回転
駆動機構と、前記テーブル面の位置を換え設定す
る第一の移動機構と、前記第一の移動機構によつ
て所定方向に設定されたテーブル面に対して移動
可能で且つテーブルに吸着支持された前記基板の
下端辺部に対接するよう配設されるレジスト膜剥
離手段と、前記レジスト膜剥離手段を移動させる
第二の移動機構と、前記レジスト膜剥離手段でレ
ジスト剥離した基板の少なくともレジスト膜剥離
部分近傍へ接離可能に配設された乾燥手段とを具
備して成ることを特徴とするレジスト膜剥離装置
。 a rotatable table that sucks and supports a substrate coated with a resist film; a rotation drive mechanism that rotates the table; a first moving mechanism that changes and sets the position of the table surface; Therefore, the resist film stripping means is movable with respect to a table surface set in a predetermined direction and is disposed so as to be in contact with the lower edge portion of the substrate suction-supported by the table, and the resist film stripping means is moved. and a drying means disposed so as to be able to come into contact with at least the vicinity of the resist film peeled portion of the substrate from which the resist film has been peeled off by the resist film peeling means. Device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9330786U JPS63900U (en) | 1986-06-20 | 1986-06-20 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9330786U JPS63900U (en) | 1986-06-20 | 1986-06-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63900U true JPS63900U (en) | 1988-01-06 |
Family
ID=30955787
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9330786U Pending JPS63900U (en) | 1986-06-20 | 1986-06-20 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63900U (en) |
-
1986
- 1986-06-20 JP JP9330786U patent/JPS63900U/ja active Pending
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