JPS6311426B2 - - Google Patents

Info

Publication number
JPS6311426B2
JPS6311426B2 JP55183458A JP18345880A JPS6311426B2 JP S6311426 B2 JPS6311426 B2 JP S6311426B2 JP 55183458 A JP55183458 A JP 55183458A JP 18345880 A JP18345880 A JP 18345880A JP S6311426 B2 JPS6311426 B2 JP S6311426B2
Authority
JP
Japan
Prior art keywords
electrodes
wafer
voltage
capacitance
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55183458A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57108264A (en
Inventor
Naomichi Abe
Masanao Itoga
Moritaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18345880A priority Critical patent/JPS57108264A/ja
Publication of JPS57108264A publication Critical patent/JPS57108264A/ja
Publication of JPS6311426B2 publication Critical patent/JPS6311426B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Manipulator (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
JP18345880A 1980-12-24 1980-12-24 Operating method for electrostatic adsorbing device Granted JPS57108264A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18345880A JPS57108264A (en) 1980-12-24 1980-12-24 Operating method for electrostatic adsorbing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18345880A JPS57108264A (en) 1980-12-24 1980-12-24 Operating method for electrostatic adsorbing device

Publications (2)

Publication Number Publication Date
JPS57108264A JPS57108264A (en) 1982-07-06
JPS6311426B2 true JPS6311426B2 (enrdf_load_stackoverflow) 1988-03-14

Family

ID=16136125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18345880A Granted JPS57108264A (en) 1980-12-24 1980-12-24 Operating method for electrostatic adsorbing device

Country Status (1)

Country Link
JP (1) JPS57108264A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59129686A (ja) * 1983-01-10 1984-07-26 増田　閃一 静電式微小物体吸引装置
JPS59129779A (ja) * 1983-01-13 1984-07-26 Tokuda Seisakusho Ltd スパツタリング装置の静電チヤツク装置
JPS59129778A (ja) * 1983-01-13 1984-07-26 Tokuda Seisakusho Ltd スパツタリング装置
JP2581066B2 (ja) * 1987-03-31 1997-02-12 富士通株式会社 ウエ−ハ搬送方法及び装置
JP2008015435A (ja) * 2006-07-10 2008-01-24 Ricoh Co Ltd 画像形成装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5414333Y2 (enrdf_load_stackoverflow) * 1975-08-31 1979-06-14
JPS597605B2 (ja) * 1975-12-26 1984-02-20 フジゼロツクス カブシキガイシヤ カミノムセツテンケンチソウチ

Also Published As

Publication number Publication date
JPS57108264A (en) 1982-07-06

Similar Documents

Publication Publication Date Title
JPS5979545A (ja) 静電チャック装置
US5325261A (en) Electrostatic chuck with improved release
JP4484883B2 (ja) 被吸着物の処理方法
JP2001284442A (ja) 静電チャック及びその製造方法
JPH06204325A (ja) 静電吸着装置およびその吸着方法
JPS6311426B2 (enrdf_load_stackoverflow)
JP2695436B2 (ja) 静電チャックの劣化検出回路
JP3913355B2 (ja) 被吸着物の処理方法
JP2017512378A (ja) ワークピースをクランプするためのシステムおよび方法 関連出願の相互参照 本願は、２０１４年２月７日に出願された米国仮特許出願番号第６１／９３７０５０号の優先権を主張するものである。仮特許出願の内容は、この参照によってここに援用される。
JPH07130827A (ja) ウエーハ静電吸着装置
JPH0536806A (ja) 静電チヤツクの過渡特性評価装置及び方法
JPH11214494A (ja) 静電チャック
JP4926688B2 (ja) 静電チャックの誘電体層の体積抵抗率測定装置及びその装置を用いた測定方法
JP2004259974A (ja) リフトピン
JPH1167884A (ja) 静電吸着装置およびそれを用いた電子線描画装置
JP4579206B2 (ja) 離脱状態判断方法及び真空処理装置
JPS5967629A (ja) 静電吸着装置
JPH09184794A (ja) 薄膜引張試験方法および装置
JP3771766B2 (ja) 静電チャック評価装置及び静電チャック評価方法
JP4009009B2 (ja) 吸着状態判断方法
JPH0368330B2 (enrdf_load_stackoverflow)
JPH07263529A (ja) 静電吸着装置
JPH0866071A (ja) 静電吸着装置
JPH06224286A (ja) 静電吸着装置の吸着モニター装置
JPH07283296A (ja) 静電吸着装置