JPS57108264A - Operating method for electrostatic adsorbing device - Google Patents

Operating method for electrostatic adsorbing device

Info

Publication number
JPS57108264A
JPS57108264A JP18345880A JP18345880A JPS57108264A JP S57108264 A JPS57108264 A JP S57108264A JP 18345880 A JP18345880 A JP 18345880A JP 18345880 A JP18345880 A JP 18345880A JP S57108264 A JPS57108264 A JP S57108264A
Authority
JP
Japan
Prior art keywords
wafer
adsorbed
insulator
electrodes
electrostatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18345880A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6311426B2 (enrdf_load_stackoverflow
Inventor
Naomichi Abe
Masanao Itoga
Moritaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18345880A priority Critical patent/JPS57108264A/ja
Publication of JPS57108264A publication Critical patent/JPS57108264A/ja
Publication of JPS6311426B2 publication Critical patent/JPS6311426B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Manipulator (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
JP18345880A 1980-12-24 1980-12-24 Operating method for electrostatic adsorbing device Granted JPS57108264A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18345880A JPS57108264A (en) 1980-12-24 1980-12-24 Operating method for electrostatic adsorbing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18345880A JPS57108264A (en) 1980-12-24 1980-12-24 Operating method for electrostatic adsorbing device

Publications (2)

Publication Number Publication Date
JPS57108264A true JPS57108264A (en) 1982-07-06
JPS6311426B2 JPS6311426B2 (enrdf_load_stackoverflow) 1988-03-14

Family

ID=16136125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18345880A Granted JPS57108264A (en) 1980-12-24 1980-12-24 Operating method for electrostatic adsorbing device

Country Status (1)

Country Link
JP (1) JPS57108264A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59129779A (ja) * 1983-01-13 1984-07-26 Tokuda Seisakusho Ltd スパツタリング装置の静電チヤツク装置
JPS59129686A (ja) * 1983-01-10 1984-07-26 増田　閃一 静電式微小物体吸引装置
JPS59129778A (ja) * 1983-01-13 1984-07-26 Tokuda Seisakusho Ltd スパツタリング装置
US4848536A (en) * 1987-03-31 1989-07-18 Fujitsu Limited Apparatus for transporting an electrically conductive wafer
JP2008015435A (ja) * 2006-07-10 2008-01-24 Ricoh Co Ltd 画像形成装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5233828U (enrdf_load_stackoverflow) * 1975-08-31 1977-03-10
JPS5279934A (en) * 1975-12-26 1977-07-05 Fuji Xerox Co Ltd Contactless paper detector

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5233828U (enrdf_load_stackoverflow) * 1975-08-31 1977-03-10
JPS5279934A (en) * 1975-12-26 1977-07-05 Fuji Xerox Co Ltd Contactless paper detector

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59129686A (ja) * 1983-01-10 1984-07-26 増田　閃一 静電式微小物体吸引装置
JPS59129779A (ja) * 1983-01-13 1984-07-26 Tokuda Seisakusho Ltd スパツタリング装置の静電チヤツク装置
JPS59129778A (ja) * 1983-01-13 1984-07-26 Tokuda Seisakusho Ltd スパツタリング装置
US4848536A (en) * 1987-03-31 1989-07-18 Fujitsu Limited Apparatus for transporting an electrically conductive wafer
JP2008015435A (ja) * 2006-07-10 2008-01-24 Ricoh Co Ltd 画像形成装置

Also Published As

Publication number Publication date
JPS6311426B2 (enrdf_load_stackoverflow) 1988-03-14

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