JPS6310811B2 - - Google Patents

Info

Publication number
JPS6310811B2
JPS6310811B2 JP54139474A JP13947479A JPS6310811B2 JP S6310811 B2 JPS6310811 B2 JP S6310811B2 JP 54139474 A JP54139474 A JP 54139474A JP 13947479 A JP13947479 A JP 13947479A JP S6310811 B2 JPS6310811 B2 JP S6310811B2
Authority
JP
Japan
Prior art keywords
group
sensitizer
photosensitive
compound
alkyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54139474A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5664335A (en
Inventor
Norimasa Aotani
Teruo Kojima
Eiji Nakakita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP13947479A priority Critical patent/JPS5664335A/ja
Priority to GB8034005A priority patent/GB2064546B/en
Priority to US06/200,653 priority patent/US4356247A/en
Priority to DE3040789A priority patent/DE3040789C2/de
Publication of JPS5664335A publication Critical patent/JPS5664335A/ja
Publication of JPS6310811B2 publication Critical patent/JPS6310811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
JP13947479A 1979-10-29 1979-10-29 Photosensitive composition Granted JPS5664335A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP13947479A JPS5664335A (en) 1979-10-29 1979-10-29 Photosensitive composition
GB8034005A GB2064546B (en) 1979-10-29 1980-10-22 Light-sensitive polymeric compositions and materials
US06/200,653 US4356247A (en) 1979-10-29 1980-10-27 Light-sensitive compositions
DE3040789A DE3040789C2 (de) 1979-10-29 1980-10-29 Lichtempfindliches Gemisch

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13947479A JPS5664335A (en) 1979-10-29 1979-10-29 Photosensitive composition

Publications (2)

Publication Number Publication Date
JPS5664335A JPS5664335A (en) 1981-06-01
JPS6310811B2 true JPS6310811B2 (forum.php) 1988-03-09

Family

ID=15246079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13947479A Granted JPS5664335A (en) 1979-10-29 1979-10-29 Photosensitive composition

Country Status (4)

Country Link
US (1) US4356247A (forum.php)
JP (1) JPS5664335A (forum.php)
DE (1) DE3040789C2 (forum.php)
GB (1) GB2064546B (forum.php)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition
JPS5872139A (ja) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd 感光性材料
JPS59160139A (ja) * 1983-03-04 1984-09-10 Hitachi Ltd 感光性重合体組成物
JPS59222833A (ja) * 1983-06-01 1984-12-14 Hitachi Chem Co Ltd 感光性組成物
US4636459A (en) * 1985-03-06 1987-01-13 Fuji Photo Film Co., Ltd. Photopolymerizable compositions
JP2589558B2 (ja) * 1988-11-11 1997-03-12 富士写真フイルム株式会社 感光性組成物
US5472823A (en) * 1992-01-20 1995-12-05 Hitachi Chemical Co., Ltd. Photosensitive resin composition
US6027849A (en) * 1992-03-23 2000-02-22 Imation Corp. Ablative imageable element
CN1094604C (zh) * 1993-12-27 2002-11-20 克拉瑞特金融(Bvi)有限公司 着色感光性树脂组合物
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
JP2002517523A (ja) * 1998-06-03 2002-06-18 キンバリー クラーク ワールドワイド インコーポレイテッド 新規な光開始剤およびその利用
ATE238393T1 (de) 1999-01-19 2003-05-15 Kimberly Clark Co Farbstoffe, farbstoffstabilisatoren, tintenzusammensetzungen und verfahren zu deren herstellung
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
US6605406B2 (en) * 2000-04-28 2003-08-12 The Chromaline Corporation Imageable photoresist laminate
ATE333471T1 (de) 2000-06-19 2006-08-15 Kimberly Clark Co Neue photoinitiatoren

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2732301A (en) * 1952-10-15 1956-01-24 Chxcxch
DE1286898B (de) * 1965-11-10 1969-01-09 Kalle Ag Lichtempfindliche Schicht
DE1772867A1 (de) * 1968-07-15 1971-06-16 Agfa Gevaert Ag Sensibilisierung von Schichten aus lichtvernetzbaren Polymeren
GB1359472A (en) * 1970-09-01 1974-07-10 Agfa Gevaert Photographic recording and reproduction of information
US3699025A (en) * 1971-03-18 1972-10-17 Eastman Kodak Co Process for radiation cross-linking utilizing n-heterocyclic compounds with cleavable oxy substituents
FR2135790A5 (en) * 1971-04-29 1972-12-22 Kodak Pathe Rhodanine sensitisers - for polyester based photosensitive compsns
JPS505032A (forum.php) * 1972-12-29 1975-01-20
US4033773A (en) * 1974-08-27 1977-07-05 Horizons Incorporated, A Division Of Horizons Research Incorporated Radiation produced colored photopolymer systems
US4062686A (en) * 1976-04-21 1977-12-13 Eastman Kodak Company Sensitizers for photocrosslinkable polymers
JPS5928326B2 (ja) * 1976-12-02 1984-07-12 富士写真フイルム株式会社 光重合性組成物
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer

Also Published As

Publication number Publication date
JPS5664335A (en) 1981-06-01
GB2064546A (en) 1981-06-17
US4356247A (en) 1982-10-26
GB2064546B (en) 1983-08-24
DE3040789C2 (de) 1986-10-30
DE3040789A1 (de) 1981-05-07

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