JPS629716Y2 - - Google Patents

Info

Publication number
JPS629716Y2
JPS629716Y2 JP1981108587U JP10858781U JPS629716Y2 JP S629716 Y2 JPS629716 Y2 JP S629716Y2 JP 1981108587 U JP1981108587 U JP 1981108587U JP 10858781 U JP10858781 U JP 10858781U JP S629716 Y2 JPS629716 Y2 JP S629716Y2
Authority
JP
Japan
Prior art keywords
wafer
rotating shaft
coil
photoresist
rotation device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1981108587U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5815346U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10858781U priority Critical patent/JPS5815346U/ja
Publication of JPS5815346U publication Critical patent/JPS5815346U/ja
Application granted granted Critical
Publication of JPS629716Y2 publication Critical patent/JPS629716Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
JP10858781U 1981-07-23 1981-07-23 ウエハ回転装置 Granted JPS5815346U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10858781U JPS5815346U (ja) 1981-07-23 1981-07-23 ウエハ回転装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10858781U JPS5815346U (ja) 1981-07-23 1981-07-23 ウエハ回転装置

Publications (2)

Publication Number Publication Date
JPS5815346U JPS5815346U (ja) 1983-01-31
JPS629716Y2 true JPS629716Y2 (enrdf_load_stackoverflow) 1987-03-06

Family

ID=29902986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10858781U Granted JPS5815346U (ja) 1981-07-23 1981-07-23 ウエハ回転装置

Country Status (1)

Country Link
JP (1) JPS5815346U (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH043992Y2 (enrdf_load_stackoverflow) * 1986-01-30 1992-02-06

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5759438U (enrdf_load_stackoverflow) * 1980-09-26 1982-04-08

Also Published As

Publication number Publication date
JPS5815346U (ja) 1983-01-31

Similar Documents

Publication Publication Date Title
JP2855046B2 (ja) 回転式基板処理装置用の基板回転保持装置
US20020033230A1 (en) Polishing apparatus, semiconductor device manufacturing method using the polishing apparatus, and semiconductor device manufactured by the manufacturing method
JPS629716Y2 (enrdf_load_stackoverflow)
JPH07263302A (ja) レジストの現像方法
US6010255A (en) Acoustic wave enhanced developer
JPH0341715A (ja) スピンコーター
JPH08196972A (ja) 回転カップ式塗布方法及び塗布装置
JPH11150056A (ja) レジストの塗布装置
JPH07263474A (ja) 半導体ウェーハの塗布装置
JP2657392B2 (ja) 回転処理装置
JPS6251226A (ja) 研磨方法
JPH05136039A (ja) レジスト塗布装置および半導体装置の製造方法
JPH02220429A (ja) レジストの塗布装置及びその塗布方法
JPS6130282Y2 (enrdf_load_stackoverflow)
JPH11274042A (ja) 基板処理装置
JPS60226124A (ja) レジスト塗布装置
JPH01164034A (ja) ウェハース周辺部膜厚均一化機構
JPS6245378A (ja) 塗布装置
JPH02219213A (ja) レジスト塗布装置
JPH02264421A (ja) レジスト回転塗布装置
JPH08124844A (ja) ウエハステージ
JPS63232431A (ja) 現像方法
JPS62285421A (ja) レジスト塗布装置
JPS6254922A (ja) レジスト塗布装置
JPH04256309A (ja) 半導体製造装置