JPS628940B2 - - Google Patents
Info
- Publication number
- JPS628940B2 JPS628940B2 JP329780A JP329780A JPS628940B2 JP S628940 B2 JPS628940 B2 JP S628940B2 JP 329780 A JP329780 A JP 329780A JP 329780 A JP329780 A JP 329780A JP S628940 B2 JPS628940 B2 JP S628940B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- conductivity type
- semiconductor
- electrode
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 19
- 108091006146 Channels Proteins 0.000 description 10
- 230000015556 catabolic process Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 6
- 229920005591 polysilicon Polymers 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 108010075750 P-Type Calcium Channels Proteins 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
- H01L21/76213—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose
- H01L21/76216—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Bipolar Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP329780A JPS56100442A (en) | 1980-01-16 | 1980-01-16 | Semiconductor ic device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP329780A JPS56100442A (en) | 1980-01-16 | 1980-01-16 | Semiconductor ic device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56100442A JPS56100442A (en) | 1981-08-12 |
JPS628940B2 true JPS628940B2 (ko) | 1987-02-25 |
Family
ID=11553433
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP329780A Granted JPS56100442A (en) | 1980-01-16 | 1980-01-16 | Semiconductor ic device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56100442A (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61263254A (ja) * | 1985-05-17 | 1986-11-21 | Nec Corp | 入力保護装置 |
-
1980
- 1980-01-16 JP JP329780A patent/JPS56100442A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS56100442A (en) | 1981-08-12 |
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