JPS6278820A - レジスト現像方法 - Google Patents
レジスト現像方法Info
- Publication number
- JPS6278820A JPS6278820A JP21854485A JP21854485A JPS6278820A JP S6278820 A JPS6278820 A JP S6278820A JP 21854485 A JP21854485 A JP 21854485A JP 21854485 A JP21854485 A JP 21854485A JP S6278820 A JPS6278820 A JP S6278820A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- resist
- developed
- substrate
- developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 18
- 239000004065 semiconductor Substances 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21854485A JPS6278820A (ja) | 1985-10-01 | 1985-10-01 | レジスト現像方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21854485A JPS6278820A (ja) | 1985-10-01 | 1985-10-01 | レジスト現像方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6278820A true JPS6278820A (ja) | 1987-04-11 |
| JPH0543172B2 JPH0543172B2 (enrdf_load_stackoverflow) | 1993-06-30 |
Family
ID=16721593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21854485A Granted JPS6278820A (ja) | 1985-10-01 | 1985-10-01 | レジスト現像方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6278820A (enrdf_load_stackoverflow) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5422777A (en) * | 1977-07-22 | 1979-02-20 | Hitachi Ltd | Invertible processing device |
| JPS5452984A (en) * | 1977-10-04 | 1979-04-25 | Nec Corp | Semiconductor cleansing method |
| JPS57192955A (en) * | 1981-05-25 | 1982-11-27 | Toppan Printing Co Ltd | Developing method |
| JPS593549A (ja) * | 1982-06-30 | 1984-01-10 | Hitachi Ltd | フアイル管理方式 |
-
1985
- 1985-10-01 JP JP21854485A patent/JPS6278820A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5422777A (en) * | 1977-07-22 | 1979-02-20 | Hitachi Ltd | Invertible processing device |
| JPS5452984A (en) * | 1977-10-04 | 1979-04-25 | Nec Corp | Semiconductor cleansing method |
| JPS57192955A (en) * | 1981-05-25 | 1982-11-27 | Toppan Printing Co Ltd | Developing method |
| JPS593549A (ja) * | 1982-06-30 | 1984-01-10 | Hitachi Ltd | フアイル管理方式 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0543172B2 (enrdf_load_stackoverflow) | 1993-06-30 |
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