JPS6260811B2 - - Google Patents

Info

Publication number
JPS6260811B2
JPS6260811B2 JP57223187A JP22318782A JPS6260811B2 JP S6260811 B2 JPS6260811 B2 JP S6260811B2 JP 57223187 A JP57223187 A JP 57223187A JP 22318782 A JP22318782 A JP 22318782A JP S6260811 B2 JPS6260811 B2 JP S6260811B2
Authority
JP
Japan
Prior art keywords
chamber
exhaust
sample
spin
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57223187A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59121839A (ja
Inventor
Kazuya Watanabe
Takenori Ookubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP22318782A priority Critical patent/JPS59121839A/ja
Publication of JPS59121839A publication Critical patent/JPS59121839A/ja
Publication of JPS6260811B2 publication Critical patent/JPS6260811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/162Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP22318782A 1982-12-20 1982-12-20 スピン塗布装置 Granted JPS59121839A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22318782A JPS59121839A (ja) 1982-12-20 1982-12-20 スピン塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22318782A JPS59121839A (ja) 1982-12-20 1982-12-20 スピン塗布装置

Publications (2)

Publication Number Publication Date
JPS59121839A JPS59121839A (ja) 1984-07-14
JPS6260811B2 true JPS6260811B2 (zh) 1987-12-18

Family

ID=16794161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22318782A Granted JPS59121839A (ja) 1982-12-20 1982-12-20 スピン塗布装置

Country Status (1)

Country Link
JP (1) JPS59121839A (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6227779U (zh) * 1985-08-02 1987-02-19
JPS62237966A (ja) * 1986-04-09 1987-10-17 Pioneer Electronic Corp 薄膜形成装置
US6516816B1 (en) * 1999-04-08 2003-02-11 Applied Materials, Inc. Spin-rinse-dryer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103132A (ja) * 1981-12-16 1983-06-20 Konishiroku Photo Ind Co Ltd スピンナ−装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58103132A (ja) * 1981-12-16 1983-06-20 Konishiroku Photo Ind Co Ltd スピンナ−装置

Also Published As

Publication number Publication date
JPS59121839A (ja) 1984-07-14

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