JPS6258668B2 - - Google Patents
Info
- Publication number
- JPS6258668B2 JPS6258668B2 JP57221217A JP22121782A JPS6258668B2 JP S6258668 B2 JPS6258668 B2 JP S6258668B2 JP 57221217 A JP57221217 A JP 57221217A JP 22121782 A JP22121782 A JP 22121782A JP S6258668 B2 JPS6258668 B2 JP S6258668B2
- Authority
- JP
- Japan
- Prior art keywords
- circuit section
- semiconductor substrate
- section
- analog circuit
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/858—Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57221217A JPS59111357A (ja) | 1982-12-17 | 1982-12-17 | C−mos集積回路とその使用方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57221217A JPS59111357A (ja) | 1982-12-17 | 1982-12-17 | C−mos集積回路とその使用方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59111357A JPS59111357A (ja) | 1984-06-27 |
JPS6258668B2 true JPS6258668B2 (enrdf_load_stackoverflow) | 1987-12-07 |
Family
ID=16763295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57221217A Granted JPS59111357A (ja) | 1982-12-17 | 1982-12-17 | C−mos集積回路とその使用方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59111357A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02139770U (enrdf_load_stackoverflow) * | 1989-04-26 | 1990-11-21 | ||
JPH0593852U (ja) * | 1991-12-20 | 1993-12-21 | 株式会社ビビッド | 表装電話帳 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2564894B2 (ja) * | 1988-06-28 | 1996-12-18 | 日本電気株式会社 | 半導体集積回路装置 |
JP3918220B2 (ja) * | 1997-02-27 | 2007-05-23 | ソニー株式会社 | 半導体装置及びその製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5279787A (en) * | 1975-12-26 | 1977-07-05 | Toshiba Corp | Integrated circuit device |
-
1982
- 1982-12-17 JP JP57221217A patent/JPS59111357A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02139770U (enrdf_load_stackoverflow) * | 1989-04-26 | 1990-11-21 | ||
JPH0593852U (ja) * | 1991-12-20 | 1993-12-21 | 株式会社ビビッド | 表装電話帳 |
Also Published As
Publication number | Publication date |
---|---|
JPS59111357A (ja) | 1984-06-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1584056A (en) | Logic circuit using cmos transistors | |
JPS54157092A (en) | Semiconductor integrated circuit device | |
JPS6258668B2 (enrdf_load_stackoverflow) | ||
JPS5753944A (en) | Semiconductor integrated circuit | |
JPS56110264A (en) | High withstand voltage mos transistor | |
JPH09500761A (ja) | 半導体素子に使用される寄生的mosトランジスタを有するパッド構造 | |
JPS5937858B2 (ja) | 半導体装置およびその製法 | |
JPS6236395B2 (enrdf_load_stackoverflow) | ||
JPH01268049A (ja) | 拡散抵抗素子 | |
JPS54128295A (en) | Mis-type semiconductor integrated circuit device | |
JPS5923569A (ja) | 半導体可変容量素子 | |
JPS585006A (ja) | 白色雑音を発生させる方法 | |
KR850005159A (ko) | 기판에 전원 공급 통로를 가진 반도체 집적회로 | |
JPS5710247A (en) | Semiconductor device | |
JPS61283170A (ja) | Mos集積回路装置 | |
KR970013431A (ko) | 모스형 반도체 커패시터 | |
JPH03108373A (ja) | 半導体装置 | |
JPS55140261A (en) | Substrate potential generator | |
JPS5346287A (en) | Production of semiconductor integrated circuit | |
JPS5563863A (en) | Semiconductor integrated circuit | |
JPS5850426B2 (ja) | 自己基板バイアスレベルの安定化方法 | |
JPS57211741A (en) | Semiconductor device | |
JPS55128864A (en) | Semiconductor device | |
JPS60103672A (ja) | 半導体装置 | |
KR970053904A (ko) | 반도체 소자의 구조 |